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1. (WO2019005168) PHASE-CHANGE MATERIAL BASED SELECTOR FOR LOW VOLTAGE BIPOLAR MEMORY DEVICES AND THEIR METHODS OF FABRICATION
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Pub. No.: WO/2019/005168 International Application No.: PCT/US2017/040511
Publication Date: 03.01.2019 International Filing Date: 30.06.2017
IPC:
H01L 45/00 (2006.01) ,H01L 43/10 (2006.01) ,H01L 43/12 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
45
Solid state devices specially adapted for rectifying, amplifying, oscillating, or switching without a potential-jump barrier or surface barrier, e.g. dielectric triodes; Ovshinsky-effect devices; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
43
Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
10
Selection of materials
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
43
Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
12
Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Applicants:
KARPOV, Elijah V. [US/US]; US
KENCKE, David L. [US/US]; US
MAJHI, Prashant [IN/US]; US
DOYLE, Brian S. [IE/US]; US
INTEL CORPORATION [US/US]; 2200 Mission College Boulevard Santa Clara, California 95054, US
Inventors:
KARPOV, Elijah V.; US
KENCKE, David L.; US
MAJHI, Prashant; US
DOYLE, Brian S.; US
Agent:
BRASK, Justin, K.; US
Priority Data:
Title (EN) PHASE-CHANGE MATERIAL BASED SELECTOR FOR LOW VOLTAGE BIPOLAR MEMORY DEVICES AND THEIR METHODS OF FABRICATION
(FR) SÉLECTEUR À BASE DE MATÉRIAU À CHANGEMENT DE PHASE POUR DISPOSITIFS DE MÉMOIRE BIPOLAIRE BASSE TENSION ET LEURS PROCÉDÉS DE FABRICATION
Abstract:
(EN) A memory device includes a wordline disposed above a substrate and a selector element disposed above the wordline, where the selector element includes a phase change material. The memory device further includes a bipolar memory element dsiposed above the wordline, a conductive electrode between the selector element and the bipolar memory element and a bitline diposed above the wordline.
(FR) L'invention concerne un dispositif de mémoire qui comprend une ligne de mots disposée au-dessus d'un substrat et un élément de sélecteur disposé au-dessus de la ligne de mots, l'élément de sélecteur comprenant un matériau à changement de phase. Le dispositif de mémoire comprend en outre un élément de mémoire bipolaire disposé au-dessus de la ligne de mots, une électrode conductrice entre l'élément de sélecteur et l'élément de mémoire bipolaire, et une ligne de bits disposée au-dessus de la ligne de mots.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)