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1. (WO2019004433) METHOD FOR PRODUCING ZERO-AZIMUTHAL ANCHORING FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT
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Pub. No.: WO/2019/004433 International Application No.: PCT/JP2018/024824
Publication Date: 03.01.2019 International Filing Date: 29.06.2018
IPC:
G02F 1/1337 (2006.01) ,C08F 2/00 (2006.01) ,C08J 7/04 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1337
Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
7
Chemical treatment or coating of shaped articles made of macromolecular substances
04
Coating
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
野田 尚宏 NODA Takahiro; JP
森内 正人 MORIUCHI Masato; JP
Agent:
特許業務法人 津国 TSUKUNI & ASSOCIATES; 東京都千代田区麹町5-3-1 麹町ビジネスセンター Kojimachi Business Center, 5-3-1, Kojimachi, Chiyoda-ku, Tokyo 1020083, JP
山村 大介 YAMAMURA Daisuke; JP
Priority Data:
2017-12921830.06.2017JP
2018-11559418.06.2018JP
Title (EN) METHOD FOR PRODUCING ZERO-AZIMUTHAL ANCHORING FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT
(FR) PROCÉDÉ POUR PRODUIRE UN FILM D’ANCRAGE D’AZIMUT ZÉRO, ET ÉLÉMENT D’AFFICHAGE À CRISTAUX LIQUIDES
(JA) ゼロ面アンカリング膜の製造方法及び液晶表示素子
Abstract:
(EN) Provided are: a method for producing a zero-azimuthal anchoring film on an industrial scale; and a good liquid crystal display element and a method for producing a liquid crystal display element, in each of which the aforementioned method is employed. A method for producing a zero-azimuthal anchoring film, the method including a step of applying an energy sufficient to cause a polymerization reaction of a radical-polymerizable compound while coming a liquid crystal composition containing a liquid crystal and the radical-polymerizable compound into contact with a radical generation film; and a method for producing a functional film, the method including a step of preparing a cell in which a liquid crystal composition containing a liquid crystal and a radical-polymerizable compound is arranged between a first substrate having a radical generation film and a second substrate having no radical generation film and a step of applying an energy sufficient to cause a polymerization reaction of the radical-polymerizable compound to the cell.
(FR) La présente invention concerne : un procédé pour produire un film d’ancrage d’azimut zéro à une échelle industrielle ; et un bon élément d’affichage à cristaux liquides et un procédé pour produire un élément d’affichage à cristaux liquides, dans chacun desquels le procédé susmentionné est utilisé. La présente invention concerne : un procédé pour produire un film d’ancrage d’azimut zéro comprenant une étape d’application d’une énergie suffisante pour provoquer une réaction de polymérisation d’un composé polymérisable par voie radicalaire durant laquelle une composition de cristaux liquides contenant un cristal liquide et le composé polymérisable par voie radicalaire viennent en contact avec un film de génération de radicaux ; et un procédé pour produire un film fonctionnel incluant une étape de préparation d’une cellule dans laquelle une composition de cristaux liquides, contenant un cristal liquide et un composé polymérisable par voie radicalaire, est disposée entre un premier substrat ayant un film de génération de radicaux et un second substrat n’ayant pas de film de génération de radicaux, et une étape d’application d’une énergie suffisante pour provoquer une réaction de polymérisation du composé polymérisable par voie radicalaire à la cellule.
(JA) ゼロ面アンカリング膜の工業的な製造方法、および、それを用いる良好な液晶表示素子及び液晶表示素子の製造方法を提供する。 液晶及びラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜 に接触させた状態で、前記ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与えるステップを含む、ゼロ面アンカリング膜の製造方法。および、液晶及びラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜を有する第一基板とラジカル発生膜を有さない第二基板との間に有するセルを用意するステップ、及び前記セルに、前記ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与えるステップを含む機能膜の作成方法とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)