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1. (WO2019002014) DEVICE FOR TRANSPORTING A SUBSTRATE, TREATMENT DEVICE WITH A RECEIVING PLATE ADAPTED TO A SUBSTRATE CARRIER OF A DEVICE OF THIS KIND, AND METHOD FOR PROCESSING A SUBSTRATE USING A DEVICE OF THIS KIND FOR THE TRANSPORT OF A SUBSTRATE, AND TREATMENT FACILITY
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/002014 International Application No.: PCT/EP2018/066192
Publication Date: 03.01.2019 International Filing Date: 19.06.2018
IPC:
H01L 21/673 (2006.01) ,H01L 21/687 (2006.01) ,H01L 21/67 (2006.01) ,C23C 16/509 (2006.01) ,C23C 16/458 (2006.01) ,H01J 37/32 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
673
using specially adapted carriers
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
505
using radio frequency discharges
509
using internal electrodes
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
458
characterised by the method used for supporting substrates in the reaction chamber
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
Applicants:
MEYER BURGER (GERMANY) GMBH [DE/DE]; An der Baumschule 6 - 8 09337 Hohenstein-Ernstthal, DE
Inventors:
SCHLEMM, Hermann; DE
KEHR, Mirko; DE
ANSORGE, Erik; DE
RASCHKE, Sebastian; DE
Agent:
KAILUWEIT & UHLEMANN PATENTANWÄLTE PARTNERSCHAFT MBB; Bamberger Straße 49 01187 Dresden, DE
Priority Data:
17178276.628.06.2017EP
Title (EN) DEVICE FOR TRANSPORTING A SUBSTRATE, TREATMENT DEVICE WITH A RECEIVING PLATE ADAPTED TO A SUBSTRATE CARRIER OF A DEVICE OF THIS KIND, AND METHOD FOR PROCESSING A SUBSTRATE USING A DEVICE OF THIS KIND FOR THE TRANSPORT OF A SUBSTRATE, AND TREATMENT FACILITY
(FR) DISPOSITIF DE TRANSPORT D'UN SUBSTRAT, DISPOSITIF DE TRAITEMENT DOTÉ D'UNE PLAQUE DE RÉCEPTION ADAPTÉE À UN SUPPORT DE SUBSTRAT D'UN TEL DISPOSITIF, PROCÉDÉ DE TRAITEMENT D'UN SUBSTRAT À L'AIDE D'UN TEL DISPOSITIF DE TRANSPORT D'UN SUBSTRAT AINSI QU'INSTALLATION DE TRAITEMENT
(DE) VORRICHTUNG ZUM TRANSPORT EINES SUBSTRATS, BEHANDLUNGSVORRICHTUNG MIT EINER AN EINEN SUBSTRATTRÄGER EINER SOLCHEN VORRICHTUNG ANGEPASSTEN AUFNAHMEPLATTE UND VERFAHREN ZUM PROZESSIEREN EINES SUBSTRATES UNTER NUTZUNG EINER SOLCHEN VORRICHTUNG ZUM TRANSPORT EINES SUBSTRATS SOWIE BEHANDLUNGSANLAGE
Abstract:
(EN) The invention relates to a device for transporting a substrate into or away from a treatment device, a treatment device, a method for processing a substrate and a treatment facility with a movement arrangement for moving a device of this kind for transporting a substrate. The device for transporting a substrate comprises a substrate carrier which contains a horizontally extending retaining surface and one or more grippers. The retaining surface is even and uniform on a first surface facing the substrate and the form thereof substantially corresponds to the form of the substrate. The surface thereof is substantially the same as the surface of the substrate, wherein the substrate is retained by its rear side on the retaining surface only by its weight. The treatment device has a receiving plate on which the substrate is retained during the treatment, wherein the receiving plate has a depression in a first surface which is suitable for accommodating a substrate carrier of this kind during treatment of the substrate.
(FR) L'invention concerne un dispositif de transport d'un substrat dans un dispositif de traitement vers ou à partir dudit dispositif de traitement, un procédé de traitement d'un substrat et une installation de traitement dotée d'un ensemble de déplacement destiné à déplacer un tel dispositif de transport d'un substrat. Selon l'invention, le dispositif de transport d'un substrat comporte un support de substrat, qui comprend une surface de retenue s'étendant horizontalement et un ou une pluralité de bras de préhension. La surface de retenue est formée plane et uniforme sur une première surface supérieure tournée vers le substrat, dont la forme correspond sensiblement à la forme du substrat et dont la surface est sensiblement égale à la surface du substrat, le substrat étant maintenu seulement à l'aide de son poids par sa face arrière sur la surface de retenue. Le dispositif de traitement comporte une plaque de réception sur laquelle le substrat est maintenu lors du traitement, la plaque de réception comportant, dans une première surface, un évidement, qui est conçu pour recevoir un tel support de substrat lors du traitement du substrat.
(DE) Die Erfindung betrifft eine Vorrichtung zum Transport eines Substrates in eine Behandlungsvorrichtung hinein oder aus dieser heraus, eine Behandlungsvorrichtung, ein Verfahren zum Prozessieren eines Substrates und eine Behandlungsanlage mit einer Bewegungsanordnung zum Bewegen einer derartigen Vorrichtung zum Transport eines Substrates. Dabei weist die Vorrichtung zum Transport eines Substrates einen Substratträger auf, der eine sich horizontal erstreckende Haltefläche und einen oder mehrere Greifarme enthält. Die Haltefläche ist auf einer dem Substrat zugewandten ersten Oberfläche eben und gleichförmig ausgebildet, deren Form im Wesentlichen der Form des Substrates entspricht und deren Fläche im Wesentlichen gleich der Fläche des Substrates ist, wobei das Substrat nur durch seine Gewichtskraft mit seiner Rückseite auf der Haltefläche gehalten wird. Die Behandlungsvorrichtung weist eine Aufnahmeplatte auf, auf der das Substrat während der Behandlung gehaltert wird, wobei die Aufnahmeplatte in einer ersten Oberfläche eine Vertiefung aufweist, die geeignet ist, einen derartigen Substratträger während der Behandlung des Substrates aufzunehmen.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)