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1. (WO2019001922) COOLING APPARATUS AND PLASMA-CLEANING STATION FOR COOLING APPARATUS
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Pub. No.: WO/2019/001922 International Application No.: PCT/EP2018/065032
Publication Date: 03.01.2019 International Filing Date: 07.06.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
KOEVOETS, Adrianus, Hendrik; NL
DE MEIJERE, Cornelis, Adrianus; NL
DE RAPPER, Willem, Michiel; NL
DONDERS, Sjoerd, Nicolaas, Lambertus; NL
GROENEWOLD, Jan; NL
LEROUX, Alain, Louis, Claude; NL
NASALEVICH, Maxim, Aleksandrovich; NL
NIKIPELOV, Andrey; NL
PIJNENBURG, Johannes, Adrianus, Cornelis, Maria; NL
VAN DER SANDEN, Jacobus, Cornelis, Gerardus; NL
Agent:
VERDONK, Peter; NL
Priority Data:
17177884.826.06.2017EP
17184274.301.08.2017EP
17201079.510.11.2017EP
Title (EN) COOLING APPARATUS AND PLASMA-CLEANING STATION FOR COOLING APPARATUS
(FR) APPAREIL DE REFROIDISSEMENT ET STATION DE NETTOYAGE AU PLASMA POUR APPAREIL DE REFROIDISSEMENT
Abstract:
(EN) A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
(FR) Un appareil lithographique comprend un système de projection conçu pour projeter un faisceau de rayonnement à motifs pour former une zone d'exposition sur un substrat, un appareil de refroidissement situé, lors de l'utilisation, au-dessus du substrat, adjacent à la zone d'exposition, l'appareil de refroidissement étant conçu pour éliminer la chaleur du substrat pendant l'utilisation, un récipient à plasma situé au-dessous de l'appareil de refroidissement, son ouverture faisant face à l'appareil de refroidissement, et une alimentation en gaz permettant de fournir du gaz au récipient à plasma et une ouverture pour la réception d'un faisceau de rayonnement. Lors de l'utilisation, le gaz fourni et un faisceau de rayonnement reçu réagissent pour former un plasma à l'intérieur du récipient à plasma qui est dirigé vers une surface de l'appareil de refroidissement qui fait face à l'ouverture du récipient à plasma.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)