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1. (WO2019000484) EVAPORATION SOURCE HEATING SYSTEM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/000484 International Application No.: PCT/CN2017/092255
Publication Date: 03.01.2019 International Filing Date: 07.07.2017
IPC:
C23C 14/26 (2006.01) ,C23C 14/54 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
26
by resistance or inductive heating of the source
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
54
Controlling or regulating the coating process
Applicants:
深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区公明街道塘明大道9-2号 No.9-2, Tangming Road, Gongming Street Guangming New District Shenzhen, Guangdong 518132, CN
Inventors:
姜亮 JIANG, Liang; CN
Agent:
深圳市铭粤知识产权代理有限公司 MING & YUE INTELLECTUAL PROPERTY LAW FIRM; 中国广东省深圳市南山区南山街道前海路泛海城市广场2栋604室 Room 604 Building 2, Oceanwide City Square, Qianhai Road, Nanshan Street, Nanshan District Shenzhen, Guangdong 518066, CN
Priority Data:
201710495891.626.06.2017CN
Title (EN) EVAPORATION SOURCE HEATING SYSTEM
(FR) SYSTÈME DE CHAUFFAGE À SOURCE D’ÉVAPORATION
(ZH) 蒸发源加热系统
Abstract:
(EN) An evaporation source heating system, comprising a vacuum heating container (10), a first heating source (20) provided around the peripheral surface of the heating container (10) and a heat equalizing layer (30) provided in the heating container (10); the heat equalizing layer (30) is provided oppositely to the inner wall of the heating container (10) to uniformly conduct heat produced from the inner wall of the heating container (10). By providing the heat equalizing layer (30) in the heating container (10) of the evaporation source heating system, on the one hand, the risk of material pyrolysis caused by excessive temperature of a local part is avoid, and on the other hand, the heating uniformity is improved. In addition, by heating the heat equalizing layer (30) in the heating container, the time required for achieving uniform heating is dramatically shortened, and the heating state of the system can also be controlled in real time more conveniently.
(FR) La présente invention concerne un système de chauffage à source d’évaporation, comprenant un récipient de chauffage sous vide (10), une première source de chauffage (20) disposée autour de la surface périphérique du récipient de chauffage (10) et une couche d’égalisation de chaleur (30) disposée dans le récipient de chauffage (10) ; la couche d’égalisation de chaleur (30) est disposée à l’opposé de la paroi interne du récipient de chauffage (10) pour conduire uniformément la chaleur produite à partir de la paroi interne du récipient de chauffage (10). En fournissant la couche d’égalisation de chaleur (30) dans le récipient de chauffage (10) du système de chauffage de source d’évaporation, d’une part, le risque de pyrolyse de matériau causée par une température excessive d’une partie locale est évité, et d’autre part, l’uniformité de chauffage est améliorée. De plus, par chauffage de la couche d’égalisation de chaleur (30) dans le récipient de chauffage, le temps nécessaire pour obtenir un chauffage uniforme est considérablement raccourci, et l’état de chauffage du système peut également être commandé en temps réel plus commodément.
(ZH) 一种蒸发源加热系统,包括真空的加热容器(10)、绕所述加热容器(10)外周面设置的第一加热源(20)以及设于所述加热容器(10)内的均热层(30),所述均热层(30)与所述加热容器(10)内壁相对设置,以均匀传导所述加热容器(10)内壁发出的热量。通过在蒸发源加热系统的加热容器(10)内设置有均热层(30),一方面避免了局部温度过高引起的材料裂解的风险,另一方面也提高了加热均匀性。另外,通过对加热容器内的均热层(30)进行加热,大幅缩短了实现均匀加热所需的时间,也更方便实时控制系统的加热状态。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)