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1. (WO2019000256) DUST REMOVAL SYSTEM WITHIN EXPOSURE MACHINE AND CONTROL METHOD
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Pub. No.: WO/2019/000256 International Application No.: PCT/CN2017/090465
Publication Date: 03.01.2019 International Filing Date: 28.06.2017
IPC:
B08B 5/00 (2006.01) ,G03F 7/20 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
5
Cleaning by methods involving the use of air flow or gas flow
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
深圳市柔宇科技有限公司 SHENZHEN ROYOLE TECHNOLOGIES CO., LTD [CN/CN]; 中国广东省深圳市 龙岗区横岗街道龙岗大道8288号大运软件小镇43栋 Building #43, Dayun Software Town, No.8288 Longgang Road, Henggang Street, Longgang District Shenzhen, Guangdong 518115, CN
Inventors:
黄顺宏 HUANG, Shunhong; CN
朱广飞 ZHU, Guangfei; CN
章勇 ZHANG, Yong; CN
罗卫 LUO, Wei; CN
闫明超 YAN, Mingchao; CN
Agent:
广州三环专利商标代理有限公司 SCIHEAD IP LAW FIRM; 中国广东省广州市 越秀区先烈中路80号汇华商贸大厦1508室 Room 1508, Huihua Commercial & Trade Building No. 80, XianLie Zhong Road, Yuexiu District Guangzhou, Guangdong 510070, CN
Priority Data:
Title (EN) DUST REMOVAL SYSTEM WITHIN EXPOSURE MACHINE AND CONTROL METHOD
(FR) SYSTÈME D'ÉLIMINATION DE POUSSIÈRE DANS UNE MACHINE D'EXPOSITION ET PROCÉDÉ DE COMMANDE
(ZH) 曝光机内的除尘系统及控制方法
Abstract:
(EN) A dust removal system within an exposure machine and a method for controlling a dust removal system within an exposure machine. The dust removal system within the exposure machine is disposed within a sealed box body (10) and comprises a control device (11), a dust removal element (12) and a sensor (13); the dust removal element (12) is disposed at a bottom portion of the box body (10) so as to discharge mirco-dust within the box body (10) to the outside of the box body (10); the sensor (13) senses the concentration of micro-dust within the box body (10), and, according to a micro-dust concentration value, the control device (11) controls the dust removal element (12) to operate.
(FR) L'invention concerne un système d'élimination de poussière dans une machine d'exposition et un procédé de commande d'un système d'élimination de poussière dans une machine d'exposition. Le système d'élimination de poussière dans la machine d'exposition est disposé dans un corps de boîte (10) étanche et comprend un dispositif de commande (11), un élément d'élimination de poussière (12) et un capteur (13) ; l'élément d'élimination de poussière (12) est disposé au niveau d'une partie inférieure du corps de boîte (10) de façon à évacuer des micro-poussières présentes dans le corps de boîte (10) à l'extérieur du corps de boîte (10) ; le capteur (13) détecte la concentration de micro-poussières dans le corps de boîte (10), et, en fonction d'une valeur de concentration de micro-poussières, le dispositif de commande (11) commande l'actionnement de l'élément d'élimination de poussière (12).
(ZH) 一种曝光机内的除尘系统以及曝光机内除尘系统的控制方法。曝光机内的除尘系统,设于封闭的箱体(10)内,包括控制装置(11)、排尘器件(12)及传感器(13);排尘器件(12)设于箱体(10)底部,以将箱体(10)内的微尘排除箱体(10)外;传感器(13)感测箱体(10)内微尘浓度,控制装置(11)根据微尘浓度值控制排尘器件(12)工作。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)