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1. (WO2018235549) COMPOSITION, FILM, LENS, SOLID STATE IMAGE SENSOR, AND COMPOUND
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Pub. No.: WO/2018/235549 International Application No.: PCT/JP2018/020669
Publication Date: 27.12.2018 International Filing Date: 30.05.2018
IPC:
C08K 5/3492 (2006.01) ,C07D 251/46 (2006.01) ,C07D 251/70 (2006.01) ,C07D 417/14 (2006.01) ,C08F 2/44 (2006.01) ,C08F 2/50 (2006.01) ,C08F 20/34 (2006.01) ,C08F 265/04 (2006.01) ,C08J 5/18 (2006.01) ,G02B 1/04 (2006.01) ,H01L 27/146 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5
Use of organic ingredients
16
Nitrogen-containing compounds
34
Heterocyclic compounds having nitrogen in the ring
3467
having more than two nitrogen atoms in the ring
3477
Six-membered rings
3492
Triazines
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
251
Heterocyclic compounds containing 1,3,5-triazine rings
02
not condensed with other rings
12
having three double bonds between ring members or between ring members and non-ring members
26
with only hetero atoms directly attached to ring carbon atoms
40
Nitrogen atoms
42
One nitrogen atom
46
with oxygen or sulfur atoms attached to the two other ring carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
251
Heterocyclic compounds containing 1,3,5-triazine rings
02
not condensed with other rings
12
having three double bonds between ring members or between ring members and non-ring members
26
with only hetero atoms directly attached to ring carbon atoms
40
Nitrogen atoms
54
Three nitrogen atoms
70
Other substituted melamines
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
417
Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/196
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
34
Esters containing nitrogen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265
Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/181
04
on to polymers of esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
04
made of organic materials, e.g. plastics
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14
including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
144
Devices controlled by radiation
146
Imager structures
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
金子 祐士 KANEKO Yushi; JP
田口 貴規 TAGUCHI Yoshinori; JP
瀧下 大貴 TAKISHITA Hirotaka; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
伊東 秀明 ITOH Hideaki; JP
三橋 史生 MITSUHASHI Fumio; JP
Priority Data:
2017-12049320.06.2017JP
2018-03533028.02.2018JP
Title (EN) COMPOSITION, FILM, LENS, SOLID STATE IMAGE SENSOR, AND COMPOUND
(FR) COMPOSITION, FILM, LENTILLE, ÉLÉMENT D'IMAGERIE À SEMI-CONDUCTEURS, ET COMPOSÉ
(JA) 組成物、膜、レンズ、固体撮像素子、化合物
Abstract:
(EN) The present invention provides a composition which is capable of forming a film having a high refractive index and which has excellent conformability to level differences. Moreover, the present invention provides a film obtained using the composition, a lens comprising the film, and a solid state image sensor comprising the film or the lens. The present invention further provides a compound used for the composition. The composition comprises a compound represented by general formula (I) and a solvent, wherein the content of the compound represented by general formula (I) is 30 mass% or more of the total solids in the composition. (A)m-X-(B)n (I)
(FR) L'invention fournit une composition qui permet de former un film présentant un indice de réfraction élevé, et qui se révèle excellente en termes d'adaptation aux différences de niveau. L'invention fournit également un film obtenu à l'aide de ladite composition, une lentille contenant ledit film, et un élément d'imagerie à semi-conducteurs contenant ledit film ou ladite lentille. De plus, l'invention fournit un composé mis en œuvre dans ladite composition. La composition de l'invention contient un composé représenté par la formule générale (I) et un solvant, la teneur en composé représenté par la formule générale (I) est supérieure ou égale à 30% en masse de la teneur en matière solide totale contenue dans la composition. (A)-X-(B) (I)
(JA) 本発明は、高い屈折率を有する膜を形成できると共に、段差追従性に優れる組成物を提供する。また、本発明は、上記組成物を用いて得られる膜、上記膜を含むレンズ、及び、上記膜又は上記レンズを含む固体撮像素子を提供する。更に、上記組成物に用いられる化合物を提供する。本発明の組成物は、下記一般式(I)で表される化合物及び溶剤を含む組成物であって、上記一般式(I)で表される化合物の含有量が、組成物中の全固形分に対して、30質量%以上である。 (A)-X-(B) (I)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)