Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018233950) SEMICONDUCTOR CHIP HAVING INTERNAL TERRACE-LIKE STEPS, AND METHOD FOR PRODUCING A SEMICONDUCTOR CHIP
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/233950 International Application No.: PCT/EP2018/062978
Publication Date: 27.12.2018 International Filing Date: 17.05.2018
IPC:
H01L 33/00 (2010.01) ,H01L 33/14 (2010.01) ,H01L 33/20 (2010.01) ,H01L 33/38 (2010.01) ,H01L 33/24 (2010.01) ,H01L 33/32 (2010.01) ,H01L 33/16 (2010.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
characterised by the semiconductor bodies
14
with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
characterised by the semiconductor bodies
20
with a particular shape, e.g. curved or truncated substrate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
36
characterised by the electrodes
38
with a particular shape
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
characterised by the semiconductor bodies
20
with a particular shape, e.g. curved or truncated substrate
24
of the light emitting region, e.g. non-planar junction
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
characterised by the semiconductor bodies
26
Materials of the light emitting region
30
containing only elements of group III and group V of the periodic system
32
containing nitrogen
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33
Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
characterised by the semiconductor bodies
16
with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
Applicants:
OSRAM OPTO SEMICONDUCTORS GMBH [DE/DE]; Leibnizstr. 4 93055 Regensburg, DE
Inventors:
TONKIKH, Alexander; DE
Agent:
ZUSAMMENSCHLUSS NR. 175 - EPPING HERMANN FISCHER PATENTANWALTSGESELLSCHAFT MBH; Schloßschmidstr. 5 80639 München, DE
Priority Data:
10 2017 113 383.619.06.2017DE
Title (EN) SEMICONDUCTOR CHIP HAVING INTERNAL TERRACE-LIKE STEPS, AND METHOD FOR PRODUCING A SEMICONDUCTOR CHIP
(FR) PUCE SEMI-CONDUCTRICE COMPRENANT DES PALIERS INTÉRIEURS SIMILAIRES À DES TERRASSES ET PROCÉDÉ DE FABRICATION D'UNE PUCE SEMI-CONDUCTRICE
(DE) HALBLEITERCHIP MIT INNEREN TERRASSENÄHNLICHEN STUFEN UND VERFAHREN ZUR HERSTELLUNG EINES HALBLEITERCHIPS
Abstract:
(EN) A semiconductor chip (10) comprising a semiconductor body (2), a current spreading layer (3) and a contact structure (4) is specified, wherein the semiconductor body comprises a first semiconductor layer (21), a second semiconductor layer (22) and an intervening active layer (23), and the current spreading layer is arranged in a vertical direction between the contact structure and the semiconductor body. The semiconductor body has a plurality of internal steps (24) configured in a terrace-like manner, wherein the contact structure comprises a plurality of conductor tracks (42) which are arranged with regard to the lateral orientations thereof in relation to the lateral orientations of the internal steps in such a way that current spreading along the internal steps is promoted vis-à-vis current spreading transversely with respect to the internal steps. Furthermore, a method for producing such a semiconductor chip is specified.
(FR) L'invention concerne une puce semi-conductrice (10) pourvue d'un corps semi-conducteur (2) d'une couche d'étalement de courant (3) et d'une structure de contact (4). Le corps semi-conducteur comprend une première couche semi-conductrice (21), une deuxième couche semi-conductrice (22) et une couche active (23) intercalée entre ces dernières. La couche d'étalement de courant est disposée dans une direction verticale entre la structure de contact et le corps semi-conducteur. Le corps semi-conducteur comporte une multitude de paliers (24) intérieurs qui sont réalisés de manière similaire à des terrasses. La structure de contact comprend une multitude de pistes conductrices (42) qui sont disposées, eu égard à leurs orientations latérales, par rapport aux orientations latérales des paliers intérieurs de telle manière qu'un étalement de courant est favorisé le long des paliers intérieurs par rapport à un étalement de courant de manière transversale par rapport aux paliers intérieurs. L’invention concerne par ailleurs un procédé de fabrication d'une puce semi-conductrice de ce type.
(DE) Es wird ein Halbleiterchip (10) mit einem Halbleiterkörper (2), einer Stromaufweitungsschicht (3) und einer Kontaktstruktur (4) angegeben, wobei der Halbleiterkörper eine erste Halbleiterschicht (21), eine zweite Halbleiterschicht (22) und eine dazwischenliegende aktive Schicht (23) umfasst und die Stromaufweitungsschicht in vertikaler Richtung zwischen der Kontaktstruktur und dem Halbleiterkörper angeordnet ist. Der Halbleiterkörper weist eine Mehrzahl von inneren Stufen (24) auf, die terrassenähnlich ausgebildet sind, wobei die Kontaktstruktur eine Mehrzahl von Leiterbahnen (42) umfasst, die hinsichtlich deren lateraler Orientierungen in Bezug zu den lateralen Orientierungen der inneren Stufen derart angeordnet sind, dass eine Stromaufweitung entlang der inneren Stufen gegenüber einer Stromaufweitung quer zu den inneren Stufen begünstigt ist. Des Weiteren wird ein Verfahren zur Herstellung eines solchen Halbleiterchips angegeben.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)