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1. (WO2018225774) LIGHT SOURCE DEVICE
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Pub. No.: WO/2018/225774 International Application No.: PCT/JP2018/021675
Publication Date: 13.12.2018 International Filing Date: 06.06.2018
IPC:
G03F 7/20 (2006.01) ,F21S 2/00 (2016.01) ,G02B 3/00 (2006.01) ,F21Y 115/10 (2016.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
21
LIGHTING
S
NON-PORTABLE LIGHTING DEVICES OR SYSTEMS THEREOF
2
Systems of lighting devices, not provided for in main groups F21S4/-F21S10/119
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3
Simple or compound lenses
[IPC code unknown for F21Y 115/10]
Applicants:
ウシオ電機株式会社 USHIO DENKI KABUSHIKI KAISHA [JP/JP]; 東京都千代田区丸の内一丁目6番5号 1-6-5, Marunouchi, Chiyoda-ku, Tokyo 1008150, JP
Inventors:
松島 竹夫 MATSUSHIMA,Takeo; JP
Agent:
特許業務法人 ユニアス国際特許事務所 UNIUS PATENT ATTORNEYS OFFICE; 大阪府大阪市淀川区西中島5丁目13-9 新大阪MTビル1号館2階 First Shin-Osaka MT Bldg. 2nd Floor, 5-13-9 Nishinakajima, Yodogawa-ku, Osaka-shi, Osaka 5320011, JP
Priority Data:
2017-11355208.06.2017JP
Title (EN) LIGHT SOURCE DEVICE
(FR) DISPOSITIF DE SOURCE LUMINEUSE
(JA) 光源装置
Abstract:
(EN) The present invention implements a light source device that achieves suppression of luminance degradation and suppression of uneven illuminance using a simple optical system configuration. A light source device (1) is provided with: a light source unit (2) that includes a plurality of LED elements (3); a first optical system (5) that narrows the divergence angle of light emitted from the light source unit (2) without collimating the light; a second optical system (7) that condenses light emitted from the first optical system (5); and an integrator optical system (8) that has an incidence surface disposed at a focus position (7f) of the second optical system (7).
(FR) La présente invention concerne un dispositif de source lumineuse qui permet de supprimer la dégradation de luminance et de supprimer un éclairement irrégulier grâce à une configuration de système optique simple. Un dispositif de source lumineuse (1) comprend : une unité de source lumineuse (2) qui comprend une pluralité d'éléments de DEL (3) ; un premier système optique (5) qui rétrécit l'angle de divergence de la lumière émise par l'unité de source lumineuse (2) sans collimater la lumière ; un second système optique (7) qui condense la lumière émise par le premier système optique (5) ; et un système optique intégrateur (8) qui a une surface d'incidence placée à une position de mise au point (7f) du second système optique (7).
(JA) 簡易な光学系の構成によって、輝度の低下の抑制と照度ムラの抑制を両立した光源装置を実現する。 光源装置(1)は、複数のLED素子(3)を含む光源部(2)と、光源部(2)から射出される光を、コリメートすることなく発散角を狭める第一光学系(5)と、第一光学系(5)から射出された光を集光する第二光学系(7)と、入射面が第二光学系(7)の焦点位置(7f)に配置されたインテグレータ光学系(8)とを備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)