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1. (WO2018224003) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
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Pub. No.: WO/2018/224003 International Application No.: PCT/CN2018/090248
Publication Date: 13.12.2018 International Filing Date: 07.06.2018
IPC:
G06F 3/041 (2006.01) ,G02F 1/1333 (2006.01)
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
北京京东方光电科技有限公司 BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国北京市 北京经济技术开发区西环中路8号 No.8 Xihuanzhonglu, BDA Beijing 100176, CN
Inventors:
彭勇 PENG, Yong; CN
张鹏举 ZHANG, Pengju; CN
李鑫 LI, Xin; CN
Agent:
北京中博世达专利商标代理有限公司 BEIJING ZBSD PATENT & TRADEMARK AGENT LTD.; 中国北京市 海淀区交大东路31号11号楼8层 8F, Building 11 No. 31 Jiaoda East Road, Haidian District Beijing 100044, CN
Priority Data:
201710437465.709.06.2017CN
Title (EN) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
(FR) SUBSTRAT DE RÉSEAU ET SON PROCÉDÉ DE FABRICATION, ET DISPOSITIF D'AFFICHAGE
(ZH) 阵列基板及其制备方法、显示装置
Abstract:
(EN) Provided are an array substrate and a manufacturing method therefor. The manufacturing method for an array substrate comprises: forming a strip-shaped barrier wall on a base substrate, wherein the width of the barrier wall is smaller than or equal to an interval to be formed between a first metal wiring and a second metal wiring; and forming the first metal wiring along one side of an extension direction of the barrier wall, and forming the second metal wiring along the other side of the extension direction of the barrier wall. Also provided are an array substrate and a display device.
(FR) La présente invention concerne un substrat de réseau et son procédé de fabrication. Le procédé de fabrication d'un substrat de matrice comprend les étapes consistant à : former une paroi de barrière en forme de bande sur un substrat de base, la largeur de la paroi de barrière étant inférieure ou égale à un intervalle devant être formé entre un premier câblage métallique et un second câblage métallique; et former le premier câblage métallique le long d'un côté d'une direction d'extension de la paroi barrière, et former le second câblage métallique le long de l'autre côté de la direction d'extension de la paroi barrière. L'invention concerne en outre un substrat de réseau et un dispositif d'affichage.
(ZH) 提供一种阵列基板的制备方法,所述阵列基板的制备方法包括:在衬底基板上形成条状的挡墙;其中,所述挡墙的宽度小于或等于待形成的第一金属走线和第二金属走线之间的间距;在所述挡墙沿延伸方向的一侧形成所述第一金属走线、在所述挡墙沿延伸方向的另一侧形成所述第二金属走线。还提供一种阵列基板、显示装置。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)