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1. (WO2018223120) FABRICATION OF MICRO/NANOSCALE BARCODES USING CANTILEVER-FREE SCANNING PROBE LITHOGRAPHY
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Pub. No.: WO/2018/223120 International Application No.: PCT/US2018/035827
Publication Date: 06.12.2018 International Filing Date: 04.06.2018
IPC:
G06K 19/06 (2006.01) ,B82Y 10/00 (2011.01) ,B82Y 40/00 (2011.01) ,G03F 7/20 (2006.01)
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
K
RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
19
Record carriers for use with machines and with at least a part designed to carry digital markings
06
characterised by the kind of the digital marking, e.g. shape, nature, code
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
Y
SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES
10
Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
Y
SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES
40
Manufacture or treatment of nano-structures
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
TERA-PRINT, LLC [US/US]; 2145 Sheridan Road Room JG38 Evanston, Illinois 60208, US
Inventors:
IVANKIN, Andrey; US
MAGOLINE, Jared A.; US
Agent:
MCCARTHY, Christine H.; US
Priority Data:
62/514,25102.06.2017US
Title (EN) FABRICATION OF MICRO/NANOSCALE BARCODES USING CANTILEVER-FREE SCANNING PROBE LITHOGRAPHY
(FR) FABRICATION DE CODES-BARRES À MICRO/NANO-ÉCHELLE PARE LITHOGRAPHIE PAR SONDE À BALAYAGE SANS PORTE-À-FAUX
Abstract:
(EN) Cantilever-Free Scanning Probe Lithography (CF-SPL) techniques are used to enable generation of 1-, 2-, 3-, and 4-D information containing patterns in a mask-free manner that, in turn, enables instantaneous change of pattern design.
(FR) Des techniques de lithographie par sonde à balayage sans porte-à-faux (CF-SPL) sont utilisées pour permettre la génération de motifs contenant des informations en 1, 2, 3 et 4-D, selon un procédé sans masque qui, à son tour, permet un changement instantané de conception de motif.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)