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1. (WO2018222977) METHODS AND COMPOSITIONS FOR ELECTROCHEMICAL DEPOSITION OF METAL RICH LAYERS IN AQUEOUS SOLUTIONS
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Pub. No.: WO/2018/222977 International Application No.: PCT/US2018/035577
Publication Date: 06.12.2018 International Filing Date: 01.06.2018
IPC:
C25D 3/54 (2006.01) ,C25D 3/56 (2006.01) ,C25D 9/08 (2006.01) ,C25D 9/10 (2006.01) ,C25D 9/12 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
3
Electroplating; Baths therefor
02
from solutions
54
of metals not provided for in groups C25D3/04-C25D3/5089
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
3
Electroplating; Baths therefor
02
from solutions
56
of alloys
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
9
Electrolytic coating other than with metals
04
with inorganic materials
08
by cathodic processes
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
9
Electrolytic coating other than with metals
04
with inorganic materials
08
by cathodic processes
10
on iron or steel
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
9
Electrolytic coating other than with metals
04
with inorganic materials
08
by cathodic processes
12
on light metals
Applicants:
LUMISHIELD TECHNOLOGIES INCORPORATED [US/US]; 1817 Parkway View Drive Building 18 Pittsburgh, Pennsylvania 15205, US
Inventors:
NULWALA, Hunaid B.; US
WATKINS, John D.; US
Agent:
CUBERT, Jeremy A.; US
Priority Data:
62/513,65401.06.2017US
Title (EN) METHODS AND COMPOSITIONS FOR ELECTROCHEMICAL DEPOSITION OF METAL RICH LAYERS IN AQUEOUS SOLUTIONS
(FR) PROCÉDÉS ET COMPOSITIONS DE DÉPÔT ÉLECTROCHIMIQUE DE COUCHES RICHES EN MÉTAL DANS DES SOLUTIONS AQUEUSES
Abstract:
(EN) Methods and compositions for electrodepositing mixed metal reactive metal layers by combining reactive metal complexes with electron withdrawing agents are provided. Modifying the ratio of one reactive metal complex to the other and varying the current density can be used to vary the morphology the metal layer on the substrate.
(FR) L'invention concerne des procédés et des compositions pour le dépôt électrolytique de couches métalliques réactives métalliques mélangées par combinaison de complexes métalliques réactifs avec des agents de retrait d'électrons. La modification du rapport d'un complexe métallique réactif à l'autre et la variation de la densité de courant peuvent être utilisées pour faire varier la morphologie de la couche métallique sur le substrat.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)