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1. (WO2018222635) ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSING

Pub. No.:    WO/2018/222635    International Application No.:    PCT/US2018/034998
Publication Date: Fri Dec 07 00:59:59 CET 2018 International Filing Date: Thu May 31 01:59:59 CEST 2018
IPC: H01L 21/687
H02N 13/00
Applicants: LAM RESEARCH CORPORATION
Inventors: GOMM, Troy Alan
Title: ELECTROSTATIC CHUCK FOR USE IN SEMICONDUCTOR PROCESSING
Abstract:
A semiconductor substrate processing apparatus includes a vacuum chamber having a processing zone in which a semiconductor substrate may be processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, a showerhead module through which process gas from the process gas source is supplied to the processing zone of the vacuum chamber, and a substrate pedestal module. The substrate pedestal module includes a platen made of ceramic material having an upper surface configured to support a semiconductor substrate thereon during processing, a stem made of ceramic material, and coplanar electrodes embedded in the platen, the electrodes including an outer RF electrode and inner electrostatic clamping electrodes, the outer RF electrode including a ring-shaped electrode and a radially extending lead extending from the ring-shaped electrode to a central portion of the platen, wherein the ceramic material of the platen and the electrodes comprise a unitary body made in a single sintering step.