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1. (WO2018222444) SELECTIVE MOLECULAR LAYER DEPOSITION OF ORGANIC AND HYBRID ORGANIC-INORGANIC LAYERS
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Pub. No.: WO/2018/222444 International Application No.: PCT/US2018/033894
Publication Date: 06.12.2018 International Filing Date: 22.05.2018
IPC:
C23C 16/455 (2006.01) ,C07F 7/10 (2006.01) ,C07D 317/36 (2006.01) ,C07D 319/06 (2006.01) ,C07D 307/89 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
08
Compounds having one or more C-Si linkages
10
containing nitrogen
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
317
Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
08
having the hetero atoms in positions 1 and 3
10
not condensed with other rings
32
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
34
Oxygen atoms
36
Alkylene carbonates; Substituted alkylene carbonates
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
319
Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
04
1,3-Dioxanes; Hydrogenated 1,3-dioxanes
06
not condensed with other rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
307
Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
77
ortho- or peri-condensed with carbocyclic rings or ring systems
87
Benzo [c] furans; Hydrogenated benzo [c] furans
89
with two oxygen atoms directly attached in positions 1 and 3
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
CHAKRABORTY, Tapash; IN
VISSER, Robert Jan; US
GORADIA, Prerna; IN
Agent:
BLANKMAN, Jeffrey I.; US
Priority Data:
62/512,06728.05.2017US
62/547,43618.08.2017US
Title (EN) SELECTIVE MOLECULAR LAYER DEPOSITION OF ORGANIC AND HYBRID ORGANIC-INORGANIC LAYERS
(FR) DÉPÔT SÉLECTIF DE COUCHES MOLÉCULAIRES CONSTITUÉES DE COUCHES ORGANIQUES ET ORGANIQUES-INORGANIQUES HYBRIDES
Abstract:
(EN) Embodiments of the disclosure relate to methods of selectively depositing organic and hybrid organic/inorganic layers. More particularly, embodiments of the disclosure are directed to methods of modifying hydroxyl terminated surfaces for selective deposition of molecular layer organic and hybrid organic/inorganic films. Additional embodiments of the disclosure relate to cyclic compounds for use in molecular layer deposition processes.
(FR) Des modes de réalisation de l'invention concernent des procédés de dépôt sélectif de couches organiques et organiques/inorganiques hybrides. Plus particulièrement, des modes de réalisation de l'invention concernent des procédés de modification de surfaces à terminaison hydroxyle pour le dépôt sélectif de films organiques et organiques/inorganiques hybrides de type couches moléculaires. D'autres modes de réalisation de l'invention concernent des composés cycliques destinés à être utilisés dans des procédés de dépôt de couches moléculaires.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)