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1. (WO2018221852) FRAME-INTEGRATED MASK

Pub. No.:    WO/2018/221852    International Application No.:    PCT/KR2018/004272
Publication Date: Fri Dec 07 00:59:59 CET 2018 International Filing Date: Fri Apr 13 01:59:59 CEST 2018
IPC: H01L 51/00
C23C 14/04
Applicants: TGO TECH. CORPORATION
주식회사 티지오테크
Inventors: JANG, Taek Yong
장택용
Title: FRAME-INTEGRATED MASK
Abstract:
The present invention relates to a frame-integrated mask. The frame-integrated mask (10) according to the present invention is used in a process of forming pixels on a silicon wafer, and comprises: a mask (20) including a mask pattern (PP); and a frame (30) joined to at least a part of a mask region (20b) excluding the region (20a) in which the mask pattern (PP) is formed, wherein the mask (20) has a shape corresponding to the silicon wafer and is integrally connected to the frame (30).