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1. (WO2018221575) MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAMINATED BODY
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Pub. No.: WO/2018/221575 International Application No.: PCT/JP2018/020744
Publication Date: 06.12.2018 International Filing Date: 30.05.2018
IPC:
G03F 7/11 (2006.01) ,B32B 27/00 (2006.01) ,C08G 61/08 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
61
Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
02
Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
04
only aliphatic carbon atoms
06
prepared by ring-opening of carbocyclic compounds
08
of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
Applicants:
三井化学株式会社 MITSUI CHEMICALS, INC. [JP/JP]; 東京都港区東新橋一丁目5番2号 5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo 1057122, JP
Inventors:
井上 浩二 INOUE Koji; JP
小田 隆志 ODA Takashi; JP
川島 啓介 KAWASHIMA Keisuke; JP
Agent:
速水 進治 HAYAMI Shinji; JP
Priority Data:
2017-10850631.05.2017JP
2017-19626006.10.2017JP
Title (EN) MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAMINATED BODY
(FR) MATÉRIAU POUR FORMER UN FILM DE SOUS-COUCHE, FILM DE SOUS-COUCHE DE RÉSERVE, PROCÉDÉ DE PRODUCTION DE FILM DE SOUS-COUCHE DE RÉSERVE ET CORPS STRATIFIÉ
(JA) 下層膜形成用材料、レジスト下層膜、レジスト下層膜の製造方法および積層体
Abstract:
(EN) The material for forming an underlayer film according to the present invention is a material for forming a resist underlayer film to be used in a multilayer resist process, the material containing a cyclic olefin polymer including repeating structure units [A] represented by general formula (1) and repeating structure units [B] represented by general formula (2). The molar ratio [A]/[B] of the structure units [A] to the structure units [B] in the cyclic olefin polymer is 5/95 to 95/5.
(FR) Le matériau pour former un film de sous-couche selon la présente invention est un matériau pour former un film de sous-couche de réserve à utiliser dans un procédé de réserve multicouche, le matériau contenant un polymère d'oléfine cyclique comprenant des motifs structurels de répétition [A] représentés par la formule générale (1) et des motifs structurels de répétition [B] représentés par la formule générale (2). Le rapport molaire [A]/[B] des motifs structurels [A] aux motifs structurels [B] dans le polymère d'oléfine cyclique est de 5/95 à 95/5.
(JA) 本発明の下層膜形成用材料は、多層レジストプロセスに用いられるレジスト下層膜を形成するための下層膜形成用材料であって、下記一般式(1)で表される繰返し構造単位[A]および下記一般式(2)で表される繰返し構造単位[B]を有する環状オレフィンポリマーを含み、上記環状オレフィンポリマーにおける上記構造単位[A]と上記構造単位[B]とのモル比[A]/[B]が5/95以上95/5以下である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)