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1. (WO2018221556) TABULAR COMPOSITE MATERIAL CONTAINING POLYTETRAFLUOROETHYLENE AND FILLER
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Pub. No.: WO/2018/221556 International Application No.: PCT/JP2018/020672
Publication Date: 06.12.2018 International Filing Date: 30.05.2018
IPC:
C08L 27/18 (2006.01) ,C08K 7/24 (2006.01) ,H05K 1/03 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
27
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
02
not modified by chemical after-treatment
12
containing fluorine atoms
18
Homopolymers or copolymers of tetrafluoroethene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
7
Use of ingredients characterised by shape
22
Expanded, porous or hollow particles
24
inorganic
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
1
Printed circuits
02
Details
03
Use of materials for the substrate
Applicants:
グ タオ Gu Tao [US/US]; US (US)
日東電工株式会社 NITTO DENKO CORPORATION [JP/JP]; 大阪府茨木市下穂積1丁目1番2号 1-2, Shimohozumi 1-chome, Ibaraki-shi, Osaka 5678680, JP
Inventors:
グ タオ Gu Tao; US
八鍬 晋平 YAKUWA Shimpei; JP
植村 高 UEMURA Kou; JP
今村 駿二 IMAMURA Shunji; JP
笠置 智之 KASAGI Tomoyuki; JP
Agent:
西藤 征彦 SAITOH Yukihiko; JP
井▲崎▼ 愛佳 IZAKI Aika; JP
西藤 優子 SAITO Yuko; JP
Priority Data:
2017-10833231.05.2017JP
62/560,43219.09.2017US
62/567,96604.10.2017US
62/619,56219.01.2018US
Title (EN) TABULAR COMPOSITE MATERIAL CONTAINING POLYTETRAFLUOROETHYLENE AND FILLER
(FR) MATÉRIAU COMPOSITE TABULAIRE CONTENANT DU POLYTÉTRAFLUOROÉTHYLÈNE ET UNE CHARGE
(JA) ポリテトラフルオロエチレン及び充填剤を含有する板状の複合材料
Abstract:
(EN) The purpose of the present invention is to provide a composite material that has a low dielectric constant, and that tends not to exhibit appearance defects or a change in properties upon exposure to a substance such as a treatment solution used in the production of electronic circuit boards. This tabular composite material, which contains polytetrafluoroethylene and a prescribed filler and satisfies a prescribed condition, has a low dielectric constant, and tends not to exhibit appearance defects or a change in properties even upon exposure to a substance such as a treatment solution used for production of an electronic circuit board.
(FR) Le but de la présente invention est de fournir un matériau composite qui présente une faible constante diélectrique, et qui tend à ne pas à présenter des défauts d'apparence ou un changement de propriétés lors de l'exposition à une substance telle qu'une solution de traitement utilisée dans la production de cartes de circuits électroniques. Ce matériau composite tabulaire, qui contient du polytétrafluoroéthylène et une charge prescrite et satisfait une condition prescrite, présente une faible constante diélectrique, et tend à ne pas présenter des défauts d'apparence ou un changement de propriétés même lors de l'exposition à une substance telle qu'une solution de traitement utilisée pour la production d'une carte de circuit électronique.
(JA) 低い比誘電率を示すとともに、電子回路基板の製造に使用される処理液等にさらされた場合に外観不良や特性変化が生じにくい複合材料を提供することを目的とする。ポリテトラフルオロエチレン及び所定の充填剤を含み、所定の条件を満たす板状の複合材料が、低い比誘電率を示すとともに、電子回路基板の製造に使用される処理液等にさらされた場合でも外観不良や特性変化が生じにくい複合材料となる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)