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1. (WO2018221274) RETARDATION FILM AND PRODUCTION METHOD
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Pub. No.: WO/2018/221274 International Application No.: PCT/JP2018/019346
Publication Date: 06.12.2018 International Filing Date: 18.05.2018
IPC:
G02B 5/30 (2006.01) ,B29C 47/14 (2006.01) ,B29C 55/02 (2006.01) ,C08J 5/18 (2006.01) ,C08L 53/02 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
47
Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
08
Component parts, details or accessories; Auxiliary operations
12
Extrusion nozzles or dies
14
with broad opening, e.g. for sheets
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
55
Shaping by stretching, e.g. drawing through a die; Apparatus therefor
02
of plates or sheets
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
53
Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
02
of vinyl aromatic monomers and conjugated dienes
Applicants:
日本ゼオン株式会社 ZEON CORPORATION [JP/JP]; 東京都千代田区丸の内一丁目6番2号 6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008246, JP
Inventors:
浅田 毅 ASADA, Takeshi; JP
摺出寺 浩成 SUDEJI, Hironari; JP
藤井 健作 FUJII, Kensaku; JP
Agent:
特許業務法人酒井国際特許事務所 SAKAI INTERNATIONAL PATENT OFFICE; 東京都千代田区霞が関3丁目8番1号 虎の門三井ビルディング Toranomon Mitsui Building, 8-1, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 1000013, JP
Priority Data:
2017-10864431.05.2017JP
Title (EN) RETARDATION FILM AND PRODUCTION METHOD
(FR) FILM DE DÉPHASAGE, ET PROCÉDÉ DE FABRICATION ASSOCIÉ
(JA) 位相差フィルム及び製造方法
Abstract:
(EN) A retardation film including an alignment layer comprising a resin C having a negative intrinsic birefringence value; and a production method therefor. The resin C has: a block (A) having as the main component thereof a polymerization unit A having a negative birefringence value; and a block (B) having as the main component thereof a polymerization unit B. The retardation film contains a block copolymer having a weight fraction for the block (A) of 50%–90% by weight and an NZ coefficient of greater than 0 and less than 1. Ideally, in the alignment layer, the resin C exhibits a phase-separated structure and the distance between phases in the phase-separated structure is no more than 200 nm.
(FR) L’invention concerne un film de déphasage et un procédé de fabrication de celui-ci. Ce film de déphasage contient une couche d’orientation constituée d’une résine (C) ayant une valeur de biréfringence propre négative. Ladite résine (C) comprend un copolymère séquencé qui possède une séquence (A) ayant pour composant principal une unité polymère A de valeur de biréfringence propre négative, et une séquence (B) ayant pour composant principal une unité polymère B, la fraction de poids de ladite séquence (A) étant supérieure ou égale à 50% en masse et inférieure ou égale à 90% en masse. Le film de déphasage présente un coefficient NZ supérieur à 0 et inférieur à 1. De préférence, dans la couche d’orientation, ladite résine (C) présente une structure de séparation de phases, la distance entre les phases dans cette structure de séparation de phases étant inférieure ou égale à 200nm.
(JA) 負の固有複屈折性値を有する樹脂Cからなる配向層を含む、位相差フィルムであって、前記樹脂Cは、負の固有複屈折値を有する重合単位Aを主成分とするブロック(A)、及び重合単位Bを主成分とするブロック(B)を有し、前記ブロック(A)の重量分率が50重量%以上90重量%以下であるブロック共重合体を含有し、0より大きく、且つ1より小さいNZ係数を有する、位相差フィルム;並びにその製造方法。好ましくは、前記配向層において、前記樹脂Cは相分離構造を呈し、前記相分離構造における相間の距離は200nm以下である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)