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1. (WO2018221228) THIN-FILM CAPACITOR AND METHOD FOR MANUFACTURING THIN-FILM CAPACITOR
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Pub. No.: WO/2018/221228 International Application No.: PCT/JP2018/018974
Publication Date: 06.12.2018 International Filing Date: 16.05.2018
IPC:
H01G 4/33 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
G
CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
4
Fixed capacitors; Processes of their manufacture
33
Thin- or thick-film capacitors
Applicants:
TDK株式会社 TDK CORPORATION [JP/JP]; 東京都港区芝浦三丁目9番1号 3-9-1, Shibaura, Minato-ku, Tokyo 1080023, JP
Inventors:
角田 晃一 TSUNODA Koichi; JP
吉川 和弘 YOSHIKAWA Kazuhiro; JP
冨川 満広 TOMIKAWA Mitsuhiro; JP
吉田 健一 YOSHIDA Kenichi; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
黒木 義樹 KUROKI Yoshiki; JP
三上 敬史 MIKAMI Takafumi; JP
Priority Data:
2017-10784931.05.2017JP
2017-10822331.05.2017JP
2017-10822631.05.2017JP
Title (EN) THIN-FILM CAPACITOR AND METHOD FOR MANUFACTURING THIN-FILM CAPACITOR
(FR) CONDENSATEUR À COUCHES MINCES ET PROCÉDÉ DE FABRICATION DE CONDENSATEUR À COUCHES MINCES
(JA) 薄膜コンデンサ及び薄膜コンデンサの製造方法
Abstract:
(EN) This thin-film capacitor is provided with: an insulating substrate; a plurality of internal electrode layers which are laminated on the insulating substrate and provided along the lamination direction; a capacitive portion having a dielectric layer sandwiched between the internal electrode layers, wherein the specific permittivity of the dielectric layer is at least 100.
(FR) L'invention porte sur un condensateur à couches minces comprenant : un substrat isolant ; une pluralité de couches d'électrode interne qui sont stratifiées sur le substrat isolant et disposées le long de la direction de stratification ; et une partie capacitive comportant une couche diélectrique prise en sandwich entre les couches d'électrode interne, la permittivité spécifique de la couche diélectrique étant au moins de 100.
(JA) 薄膜コンデンサは、絶縁基材と、絶縁基材に対して積層され、積層方向に沿って設けられた複数の内部電極層及び内部電極層に挟まれた誘電体層を有する容量部と、を備え、誘電体層の比誘電率は、100以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)