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1. (WO2018221134) LITHOGRAPHIC PRINTING PLATE PRECURSOR, RESIN COMPOSITION FOR PRODUCING LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND PRODUCTION METHOD FOR LITHOGRAPHIC PRINTING PLATE
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Pub. No.: WO/2018/221134 International Application No.: PCT/JP2018/017815
Publication Date: 06.12.2018 International Filing Date: 08.05.2018
IPC:
B41N 1/14 (2006.01) ,C08F 2/44 (2006.01) ,C08F 290/06 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/038 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
14
Lithographic printing foils
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290
Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
02
on to polymers modified by introduction of unsaturated end groups
06
Polymers provided for in subclass C08G52
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
平野 修史 HIRANO, Shuji; JP
榎本 和朗 ENOMOTO, Kazuaki; JP
野越 啓介 NOGOSHI, Keisuke; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-10800331.05.2017JP
2017-21012731.10.2017JP
Title (EN) LITHOGRAPHIC PRINTING PLATE PRECURSOR, RESIN COMPOSITION FOR PRODUCING LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND PRODUCTION METHOD FOR LITHOGRAPHIC PRINTING PLATE
(FR) PLAQUE ORIGINALE D’IMPRESSION LITHOGRAPHIQUE, COMPOSITION DE RÉSINE POUR FABRICATION DE PLAQUE ORIGINALE D’IMPRESSION LITHOGRAPHIQUE, AINSI QUE PROCÉDÉ DE FABRICATION DE PLAQUE D’IMPRESSION LITHOGRAPHIQUE
(JA) 平版印刷版原版、平版印刷版原版作製用樹脂組成物、及び、平版印刷版の作製方法
Abstract:
(EN) A lithographic printing plate precursor that has, on a hydrophilic support body, an image recording layer that includes: a polymer that has a structural unit that comprises a monomer that has a solubility parameter of at least 20 MPa1/2; an infrared absorber; and polymer particles. A composition for producing a lithographic printing plate precursor, the composition including the abovementioned polymer, infrared absorber, and polymer particles. A method for producing a lithographic printing plate using the abovementioned lithographic printing plate precursor.
(FR) L’invention concerne une plaque originale d’impression lithographique présentant une couche d’enregistrement d'image sur un support hydrophile, la couche d’enregistrement d'image contenant un polymère possédant un motif structural constitué d'un monomère dont le coefficient de solubilité est égal ou supérieur à 20MPa1/2, un agent absorbant le rayonnement infrarouge et des particules polymères. L’invention concerne également une composition de résine pour fabrication d’une plaque originale d’impression lithographique, laquelle composition de résine contient le polymère susmentionné, l’agent absorbant le rayonnement infrarouge et des particules polymères. L’invention concerne enfin un procédé de fabrication d'une plaque lithographique mettant en oeuvre la plaque originale d’impression lithographique susmentionnée.
(JA) 親水性支持体上に画像記録層を有し、上記画像記録層が、溶解度パラメーターが20MPa1/2以上であるモノマーからなる構成単位を有する重合体、赤外線吸収剤、及び、ポリマー粒子を含む平版印刷版原版;上記重合体、赤外線吸収剤、及び、ポリマー粒子を含む平版印刷版原版作製用樹脂組成物;並びに上記平版印刷版原版を用いる平版印刷版の作製方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)