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1. (WO2018220067) TARGET ASSEMBLY FOR SAFE AND ECONOMIC EVAPORATION OF BRITTLE MATERIALS
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Pub. No.: WO/2018/220067 International Application No.: PCT/EP2018/064281
Publication Date: 06.12.2018 International Filing Date: 30.05.2018
IPC:
H01J 37/34 (2006.01) ,C23C 14/35 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
35
by application of a magnetic field, e.g. magnetron sputtering
Applicants:
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON [CH/CH]; Churerstrasse 120 8808 Pfäffikon SZ, CH
Inventors:
KERSCHBAUMER, Joerg; AT
BOLVARDI, Hamid; CH
KRASSNITZER, Siegfried; AT
ESSELBACH, Markus; AT
Agent:
MISSELHORN, Martin; DE
Priority Data:
00708/1701.06.2017CH
Title (EN) TARGET ASSEMBLY FOR SAFE AND ECONOMIC EVAPORATION OF BRITTLE MATERIALS
(FR) ENSEMBLE CIBLE POUR ÉVAPORATION SÉCURISÉE ET ÉCONOMIQUE DE MATÉRIAUX FRAGILES
Abstract:
(EN) The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering processes. The present invention discloses a target assembly for PVD processes, comprising a target, and a target holding device (20), characterized in that the target (10) comprises a first bayonet lock and the target holding device (20) comprises a counterbody for the first bayonet lock of the target and a second bayonet lock for engaging the target assembly in the cooling means of the deposition chamber.
(FR) La présente invention concerne un ensemble cible qui permet un fonctionnement sécurisé, sans fracture et économique de matériaux cibles avec une faible ténacité et/ou une faible résistance à la flexion pendant des procédés d'évaporation par arc ainsi que dans des procédés de pulvérisation cathodique. La présente invention concerne un ensemble cible pour des procédés de dépôt physique en phase vapeur (PVD), comprenant une cible, et un dispositif de maintien de cible (20), caractérisé en ce que la cible (10) comprend un premier verrou à baïonnette et le dispositif de maintien de cible (20) comprend un contre-corps pour le premier verrou à baïonnette de la cible et un second verrou à baïonnette pour venir en prise avec l'ensemble cible dans le moyen de refroidissement de la chambre de dépôt.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)