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|1. (WO2018219639) METROLOGY APPARATUS|
|Applicants:||ASML NETHERLANDS B.V.
KOOLEN, Armand, Eugene, Albert
GOORDEN, Sebastianus, Adrianus
FAGGINGER AUER, Bastiaan, Onne
MATHIJSSEN, Simon, Gijsbert, Josephus
A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.