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1. (WO2018219639) METROLOGY APPARATUS

Pub. No.:    WO/2018/219639    International Application No.:    PCT/EP2018/062547
Publication Date: Fri Dec 07 00:59:59 CET 2018 International Filing Date: Wed May 16 01:59:59 CEST 2018
IPC: G03F 7/20
G01N 21/47
G01N 21/95
G01B 11/02
Applicants: ASML NETHERLANDS B.V.
Inventors: RAVENSBERGEN, Janneke
PANDEY, Nitesh
ZHOU, Zili
KOOLEN, Armand, Eugene, Albert
GOORDEN, Sebastianus, Adrianus
FAGGINGER AUER, Bastiaan, Onne
MATHIJSSEN, Simon, Gijsbert, Josephus
Title: METROLOGY APPARATUS
Abstract:
A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.