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1. (WO2018219578) RADIATION SOURCE
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Pub. No.: WO/2018/219578 International Application No.: PCT/EP2018/061243
Publication Date: 06.12.2018 International Filing Date: 03.05.2018
IPC:
H05G 2/00 (2006.01) ,H01S 3/10 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
10
Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
MULDER, Heine, Melle; NL
VAN DE KERKHOF, Marcus, Adrianus; NL
Agent:
VERDONK, Peter; NL
Priority Data:
17173481.730.05.2017EP
Title (EN) RADIATION SOURCE
(FR) SOURCE DE RAYONNEMENT
Abstract:
(EN) A radiation source comprising a fuel emitter configured to provide droplets of fuel to a plasma formation region; and a laser system configured to supply a laser beam; wherein the laser system comprises a delay line configured to delay a primary portion of the laser beam relative to a subsidiary portion of the laser beam, such that a pulse of the laser beam subsidiary portion is incident at the plasma formation region before a pulse of the laser beam primary portion.
(FR) Une source de rayonnement comprend un émetteur de combustible configuré pour fournir des gouttelettes de combustible à une région de formation de plasma; et un système laser configuré pour fournir un faisceau laser; le système laser comprenant une ligne à retard configurée pour retarder une partie primaire du faisceau laser par rapport à une partie secondaire du faisceau laser, de telle sorte qu'une impulsion de la partie secondaire du faisceau laser est incidente au niveau de la région de formation de plasma avant une impulsion de la partie primaire du faisceau laser.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)