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1. (WO2018219572) PATTERNING DEVICE

Pub. No.:    WO/2018/219572    International Application No.:    PCT/EP2018/061122
Publication Date: Fri Dec 07 00:59:59 CET 2018 International Filing Date: Thu May 03 01:59:59 CEST 2018
IPC: G03F 1/26
G03F 1/24
G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: VAN DE KERKHOF, Marcus, Adrianus
DE WINTER, Laurentius, Cornelius
VAN SETTEN, Eelco
Title: PATTERNING DEVICE
Abstract:
A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.