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1. (WO2018219569) LITHOGRAPHIC APPARATUS
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Pub. No.: WO/2018/219569 International Application No.: PCT/EP2018/061073
Publication Date: 06.12.2018 International Filing Date: 01.05.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
SCHIMMEL, Hendrikus, Gijsbertus; NL
HOFMAN, Johannes, Marinus, Abraham; NL
RANJAN, Manish; NL
GASSELING, Paulus, Albertus, Maria; NL
LEROUX, Alain, Louis, Claude; NL
YOUSEFI MOGHADDAM, Mehdi; NL
ARLEMARK, Erik, Johan; NL
HEMSCHOOTE, Dries, Vaast, Paul; NL
Agent:
VERDONK, Peter; NL
Priority Data:
17173276.129.05.2017EP
Title (EN) LITHOGRAPHIC APPARATUS
(FR) APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) A lithographic apparatus comprising a first chamber comprising a projection system, the projection system being configured to project a patterned radiation beam onto a substrate, a second chamber comprising a substrate table, the substrate table being constructed to hold a substrate, a channel extending between the first chamber and the second chamber, the channel being configured to receive a flow of purging fluid, a perimeter of the channel being defined by a wall, and a cooling system configured to cool the wall of the channel.
(FR) L'invention concerne un appareil lithographique comportant une première chambre comprenant un système de projection, le système de projection étant conçu pour projeter un faisceau de rayonnement façonné sur un substrat, une deuxième chambre comprenant une table de substrat, la table de substrat étant conçue pour maintenir un substrat, un canal qui s'étend entre la première chambre et la deuxième chambre, le canal étant conçu pour recevoir un écoulement de fluide de purge, un périmètre du canal étant défini par une paroi, et un système de refroidissement conçu pour refroidir la paroi du canal.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)