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1. (WO2018219509) PARTICLE REMOVAL APPARATUS AND ASSOCIATED SYSTEM
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Pub. No.: WO/2018/219509 International Application No.: PCT/EP2018/055283
Publication Date: 06.12.2018 International Filing Date: 05.03.2018
IPC:
G03F 7/20 (2006.01) ,B08B 6/00 (2006.01) ,H01L 21/683 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
6
Cleaning by electrostatic means
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
VAN DUIVENBODE, Jeroen; NL
VAN GILS, Petrus, Jacobus, Maria; NL
VAN DEN OEVER, Petrus, Johannes; NL
BALTIS, Coen, Hubertus, Matheus; NL
Agent:
SLENDERS, Peter; NL
Priority Data:
17173872.701.06.2017EP
17182807.224.07.2017EP
Title (EN) PARTICLE REMOVAL APPARATUS AND ASSOCIATED SYSTEM
(FR) APPAREIL D'ÉLIMINATION DE PARTICULES ET SYSTÈME ASSOCIÉ
Abstract:
(EN) An apparatus (16) for removing particles from a clamp (4), the apparatus being arrangeable in proximity of the clamp and comprising an insulating portion (18), a supporting portion (20), at least a part or all of the insulating portion being arranged on the supporting portion, wherein the supporting portion is configured such that when a voltage is applied to the supporting portion of the apparatus and/or to an electrode (8) of the clamp, the supporting portion acts as an electrode to allow an electric field to be generated between the apparatus and the clamp for removal of the particles from the clamp.
(FR) Cette invention concerne un appareil (16) d'élimination de particules à partir d'une pince (4), l'appareil pouvant être disposé à proximité de la pince et comprenant une partie isolante (18), une partie de support (20), au moins une partie ou la totalité de la partie isolante étant disposée sur la partie de support, la partie de support étant configurée de telle sorte que, lorsqu'une tension est appliquée à la partie de support de l'appareil et/ou à une électrode (8) de la pince, la partie de support sert d'électrode pour permettre à un champ électrique d'être généré entre l'appareil et la pince afin d'éliminer les particules de la pince.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)