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1. (WO2018218935) MASK PLATE, PREPARATION METHOD AND USAGE METHOD THEREFOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/218935 International Application No.: PCT/CN2017/116953
Publication Date: 06.12.2018 International Filing Date: 18.12.2017
IPC:
C23C 14/04 (2006.01) ,C23C 14/24 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
鄂尔多斯市源盛光电有限责任公司 ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. [CN/CN]; 中国内蒙古自治区鄂尔多斯市 东胜区鄂尔多斯装备制造基地 Ordos Equipment Manufacturing Base, Dongsheng District Ordos, Inner Mongolia 017020, CN
Inventors:
杨成发 YANG, Chengfa; CN
林治明 LIN, Zhiming; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710407553.202.06.2017CN
Title (EN) MASK PLATE, PREPARATION METHOD AND USAGE METHOD THEREFOR
(FR) PLAQUE DE MASQUE, PROCÉDÉ DE PRÉPARATION ET PROCÉDÉ D’UTILISATION ASSOCIÉS
(ZH) 掩模板及其制备方法和使用方法
Abstract:
(EN) A mask plate, a preparation method and a usage method therefor. The mask plate comprises: a support member (100) and a mask strip (200) which is mounted on the support member (100); the mask strip (200) comprises at least two connecting portions (220), which are connected to the support member (100), and a pattern portion (210), which is located between the connecting portions (220); the pattern portion (210) comprises a first outer surface (2101), while the connecting portions (220) comprise second outer surfaces (2301), the second outer surfaces (2301) and the first outer surface (2101) not being in the same plane. When a substrate (300) is vapor deposited by using the mask plate, the second outer surfaces (2301) may be far from the substrate (300), thereby increasing the yield of vapor depositing the substrate (300).
(FR) La présente invention concerne une plaque de masque, un procédé de préparation et un procédé d’utilisation associés. La plaque de masque comprend : un élément de support (100) et une bande de masque (200) qui est montée sur l’élément de support (100) ; la bande de masque (200) comprend au moins deux parties de liaison (220), qui sont reliées à l’élément de support (100), et une partie de motif (210), qui est située entre les parties de liaison (220) ; la partie de motif (210) comprend une première surface externe (2101), tandis que les parties de liaison (220) comprennent des deuxièmes surfaces externes (2301), les deuxièmes surfaces externes (2301) et la première surface externe (2101) n’étant pas dans le même plan. Lorsqu’un substrat (300) est déposé en phase vapeur au moyen de la plaque de masque, les deuxièmes surfaces externes (2301) peuvent être éloignées du substrat (300), de façon à augmenter le rendement de dépôt en phase vapeur du substrat (300).
(ZH) 一种掩模板及其制备方法和使用方法。该掩模板包括:支撑件(100)和安装在支撑件(100)上的掩模条(200),掩模条(200)包括与支撑件(100)连接的至少两个连接部(220),以及位于连接部(220)之间的图案部(210),图案部(210)包括第一外表面(2101),连接部(220)包括第二外表面(2301);其中,第二外表面(2301)和第一外表面(2101)不在同一平面内。在使用该掩模板对基板(300)蒸镀时,第二外表面(2301)可以远离基板(300),从而提高基板(300)蒸镀的良率。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)