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1. (WO2018218932) MASK, MASK APPARATUS AND MANUFACTURING METHOD THEREFOR, AND MASK MANUFACTURING EQUIPMENT
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Pub. No.: WO/2018/218932 International Application No.: PCT/CN2017/116610
Publication Date: 06.12.2018 International Filing Date: 15.12.2017
IPC:
C23C 14/04 (2006.01) ,H01L 51/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
成都京东方光电科技有限公司 CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国四川省成都市 高新区(西区)合作路1188号 No.1188, Hezuo Rd., (West Zone), Hi-tech Development Zone Chengdu, Sichuan 611731, CN
Inventors:
罗昶 LUO, Chang; CN
梁逸南 LIANG, Yi'nan; CN
吴海东 WU, Haidong; CN
吴建鹏 WU, Jianpeng; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710408986.X02.06.2017CN
Title (EN) MASK, MASK APPARATUS AND MANUFACTURING METHOD THEREFOR, AND MASK MANUFACTURING EQUIPMENT
(FR) MASQUE, APPAREIL DE MASQUE ET SON PROCÉDÉ DE FABRICATION, ET ÉQUIPEMENT DE FABRICATION DE MASQUE
(ZH) 掩膜板、掩膜装置及其制造方法和掩膜制造设备
Abstract:
(EN) A mask, a mask apparatus and manufacturing method therefor, and mask manufacturing equipment. The mask comprises: a pattern part (1), comprising first edges (15) and second edges (16); first stretching fitting structures (2) used to relatively stretch the pattern part (1) along a first direction, the first stretching fitting structures (2) being located on the first edges (15); and second stretching fitting structures (3) used to relatively stretch the pattern part along a second direction, the second stretching fitting structures (3) being located on the second edges (16). The first edges (15) are located at two ends of the pattern part (1) in the first direction, the second edges (16) are located at two ends of the pattern part (1) in the second direction, and the first direction and the second direction intersect.
(FR) L'invention concerne un masque, un appareil de masque et son procédé de fabrication, et un équipement de fabrication de masque. Le masque comprend : une partie de motif (1), comprenant des premiers bords (15) et des seconds bords (16); des premières structures d'ajustement d'étirement (2) utilisées pour étirer relativement la partie de motif (1) le long d'une première direction, les premières structures d'ajustement d'étirement (2) étant situées sur les premiers bords (15); et des secondes structures d'ajustement d'étirement (3) utilisées pour étirer relativement la partie de motif le long d'une seconde direction, les secondes structures d'ajustement d'étirement (3) étant situées sur les seconds bords (16). Les premiers bords (15) sont situés aux deux extrémités de la partie de motif (1) dans la première direction, les seconds bords (16) sont situés aux deux extrémités de la partie de motif (1) dans la seconde direction, et la première direction et la seconde direction se croisent.
(ZH) 一种掩膜板、掩膜装置及其制造方法和掩膜制造设备。所述掩膜板包括:图案部(1),包括第一边缘(15)和第二边缘(16);用于将所述图案部(1)沿第一方向相对拉伸的第一拉伸配合结构(2),所述第一拉伸配合结构(2)位于所述第一边缘(15)上;以及用于将所述图案部沿第二方向相对拉伸的第二拉伸配合结构(3),所述第二拉伸配合结构(3)位于所述第二边缘(16)上。所述第一边缘(15)位于所述图案部(1)在所述第一方向的两端以及所述第二边缘(16)位于所述图案部(1)在所述第二方向的两端,并且所述第一方向和所述第二方向相交。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)