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1. (WO2018218797) PLASMA REACTION DEVICE FOR PROCESSING WORKPIECES

Pub. No.:    WO/2018/218797    International Application No.:    PCT/CN2017/100466
Publication Date: Fri Dec 07 00:59:59 CET 2018 International Filing Date: Wed Sep 06 01:59:59 CEST 2017
IPC: H01J 37/32
Applicants: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
北京北方华创微电子装备有限公司
Inventors: LI, Xingcun
李兴存
Title: PLASMA REACTION DEVICE FOR PROCESSING WORKPIECES
Abstract:
The present invention provides a plasma reaction device for processing workpieces, the plasma reaction device comprising: an electron beam generating chamber, a filtering device and a process chamber. The electron beam generating chamber is located outside the process chamber and is in communication with the process chamber by means of the filtering device, and the electron beam generating chamber comprises an inductively coupled plasma source, the inductively coupled plasma source being used to generate a first plasma. The filtering device is used to cause the first plasma, when entering the process chamber by means of the filtering device, to generate an electron beam, the electron beam is used to excite the process gas in the process chamber to generate a second plasma, and the second plasma is used to process workpieces. The plasma reaction device for processing workpieces provided by the present invention can reduce the electron temperature, thereby solving the problem of the surfaces of workpieces being damaged due to the electron temperature being too high.