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1. (WO2018218612) EXTEND GROUND STRAPS LIFETIME IN PECVD PROCESS CHAMBER
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Pub. No.: WO/2018/218612 International Application No.: PCT/CN2017/086853
Publication Date: 06.12.2018 International Filing Date: 01.06.2017
IPC:
C23C 16/50 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
Applicants:
SU, Xiaoming [CN/CN]; CN (KP)
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
SU, Xiaoming; CN
SHANG, Zeren; CN
GUI, Yi; US
TINER, Robin L.; US
SUN, Shih Yao; TW
Agent:
LECOME INTELLECTUAL PROPERTY AGENT LTD.; Floor 16,Tower B of IN.DO Mansion No.48-Jia Zhichun Road, Haidian District Beijing 100098, CN
Priority Data:
Title (EN) EXTEND GROUND STRAPS LIFETIME IN PECVD PROCESS CHAMBER
(FR) EXTENSION DE LA DURÉE DE VIE DE TRESSES DE MISE À LA TERRE DANS UNE CHAMBRE DE TRAITEMENT PECVD
Abstract:
(EN) A substrate processing chamber (102) includes a plurality of ground straps (130) coupled to the substrate support (118) and chamber floor. A first end (234) of the ground strap (130) is vertically offset from a second end (236) of the ground strap (130). A substrate processing chamber (102) includes one or more ceramic plates (590) coupled to an outer perimeter of the substrate support (118) to reduce film deposition on the chamber walls (106), substrate support (118), and ground straps (130). A substrate processing chamber (102) includes one or more ground straps (130) coupled to the substrate support (118) and chamber floor. Each ground strap (130) includes an L-type block (462, 472) at one or both ends to reduce the exposed length of the ground strap (130). The apparatus extend ground strap lifetime, improve overall chamber performance, and reduce RF frequency variation in the chamber.
(FR) La présente invention concerne une chambre de traitement de substrat (102) comprenant une pluralité de tresses de mise à la terre (130) couplées au support de substrat (118) et au sol de chambre. Une première extrémité (234) de la tresse de mise à la terre (130) est décalée verticalement d'une seconde extrémité (236) de la tresse de mise à la terre (130). Une chambre de traitement de substrat (102) comprend une ou plusieurs plaques de céramique (590) accouplées à un périmètre externe du support de substrat (118) afin de réduire le dépôt de film sur les parois de la chambre (106), sur le support de substrat (118) et sur les tresses de mise à la terre (130). Une chambre de traitement de substrat (102) comprend une ou plusieurs tresses de mise à la terre (130) couplées au support de substrat (118) et au sol de chambre. Chaque tresse de mise à la terre (130) comprend un bloc en L (462, 472) à l'une et/ou à l'autre extrémité afin de réduire la longueur exposée de la tresse de mise à la terre (130). L'appareil prolonge la durée de vie de la tresse de mise à la terre, améliore la performance globale de la chambre et réduit la variation de fréquence RF dans la chambre.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)