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1. (WO2018205361) VAPOUR DEPOSITION APPARATUS
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Pub. No.: WO/2018/205361 International Application No.: PCT/CN2017/089609
Publication Date: 15.11.2018 International Filing Date: 22.06.2017
IPC:
C23C 14/24 (2006.01) ,C23C 14/04 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
Applicants:
武汉华星光电技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD [CN/CN]; 中国湖北省武汉市 东湖开发区高新大道666号生物城C5栋谭玉 TAN, Yu Building C5 Biolake of Optics Valley, No. 666 Gaoxin Avenue, East Lake High-tech Development Zone Wuhan, Hubei 430079, CN
Inventors:
夏存军 XIA, Cunjun; CN
邹新 ZOU, Xin; CN
Agent:
深圳翼盛智成知识产权事务所 (普通合伙) ESSEN PATENT&TRADEMARK AGENCY; 中国广东省深圳市 福田区深南大道6021号喜年中心A座1709-1711 Hailrun Complex Block A Room 1709-1711 No. 6021 Shennan Blvd, Futian District Shenzhen, Guangdong 518040, CN
Priority Data:
201710318766.808.05.2017CN
Title (EN) VAPOUR DEPOSITION APPARATUS
(FR) APPAREIL DE DÉPÔT EN PHASE VAPEUR
(ZH) 一种蒸镀装置
Abstract:
(EN) Provided is a vapour deposition apparatus, comprising a main chamber (11) and at least one secondary chamber (10) in communication with the main chamber (11) by means of a valve; the secondary chamber (10) comprises a suction platform (2), a suction tube (7), and a fixing member (8); when performing vapour deposition on a substrate (9) to undergo vapour deposition, the suction tube (7) attaches the substrate (9) to undergo vapour deposition to the suction platform (2) by means of the fixing member (8) and the suction platform (2), the substrate (9) to undergo vapour deposition is aligned with a mask plate (5), and the substrate (9) to undergo vapour deposition and the mask plate (5) are secured by means of the fixing member (8).
(FR) L'invention concerne un appareil de dépôt en phase vapeur, comprenant une chambre principale (11) et au moins une chambre secondaire (10) en communication avec la chambre principale (11) au moyen d'une vanne ; la chambre secondaire (10) comprend une plateforme d'aspiration (2), un tube d'aspiration (7) et un élément de fixation (8) ; lors de l'exécution d'un dépôt en phase vapeur sur un substrat (9) destiné à recevoir un dépôt en phase vapeur, le tube d'aspiration (7) fixe le substrat (9) destiné à recevoir le dépôt en phase vapeur à la plateforme d'aspiration (2) au moyen de l'élément de fixation (8) et de la plateforme d'aspiration (2) ; le substrat (9) destiné à recevoir un dépôt en phase vapeur est aligné avec une plaque de masquage (5) ; et le substrat (9) destiné à recevoir un dépôt en phase vapeur et la plaque de masquage (5) sont fixés au moyen de l'élément de fixation (8).
(ZH) 提供一种蒸镀装置,包括主腔室(11)以及至少一个通过阀门(6)与主腔室(11)相通的副腔室(10);其中,副腔室(10)包括吸附台板(2)、吸附管(7)以及固定件(8),对待蒸镀基板(9)进行蒸镀时,吸附管(7)通过固定件(8)以及吸附台板(2)将待蒸镀基板(9)吸附至吸附台板(2)上,将待蒸镀基板(9)与掩膜板(5)进行对位,并通过固定件(8)固定待蒸镀基板(9)与掩膜板(5)。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)