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1. (WO2018205345) MASK AND METHOD FOR PREPARING ARRAY SUBSTRATE

Pub. No.:    WO/2018/205345    International Application No.:    PCT/CN2017/088614
Publication Date: Fri Nov 16 00:59:59 CET 2018 International Filing Date: Sat Jun 17 01:59:59 CEST 2017
IPC: H01L 21/77
G03F 1/54
Applicants: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
深圳市华星光电技术有限公司
Inventors: GAO, Dongzi
高冬子
Title: MASK AND METHOD FOR PREPARING ARRAY SUBSTRATE
Abstract:
A mask and a method for preparing an array substrate. The mask comprises: at least two first sub-regions (101) that are arranged at intervals and are semi-transparent regions; at least one second sub-region (201) arranged in the gap between the at least two first sub-regions and having light transmittance greater than that of the first sub-regions. When a photoresist is subjected to exposure, the photoresist thickness exposed in the second sub-region is greater than that exposed in the first sub-regions; and when the array substrate is manufactured, and at least one channel of the array substrate is at the position corresponding to the at least one second sub-region. By means of the mask, the exposure and ashing time can be reduced and energy can be saved during manufacturing of the array substrate.