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1. (WO2018204576) METHOD AND APPARATUS FOR UNIFORM THERMAL DISTRIBUTION IN A MICROWAVE CAVITY DURING SEMICONDUCTOR PROCESSING

Pub. No.:    WO/2018/204576    International Application No.:    PCT/US2018/030787
Publication Date: Fri Nov 09 00:59:59 CET 2018 International Filing Date: Fri May 04 01:59:59 CEST 2018
IPC: H01L 21/67
H01L 21/324
Applicants: APPLIED MATERIALS, INC.
Inventors: RAO, Preetham
IVANOV, Dennis
JUPUDI, Ananthkrishna
OW, Yueh Sheng
Title: METHOD AND APPARATUS FOR UNIFORM THERMAL DISTRIBUTION IN A MICROWAVE CAVITY DURING SEMICONDUCTOR PROCESSING
Abstract:
Methods and apparatus for uniform thermal distribution across semiconductor batches are provided herein. According to one embodiment, a microwave oven for semiconductor processing, comprising a thermal housing having a cavity and a plurality of input ports, a power source configured to provide a microwave signal to the cavity of the thermal housing via the plurality of input ports, a phase shifter disposed between the power source and the input ports, wherein the phase shifter is configured to vary a phase difference between two or more signals provided to it; and a controller communicatively coupled to the phase shifter and configured to control the phase difference between the two or more signals.