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1. (WO2018204078) HIGH PRESSURE ANNEAL CHAMBER WITH VACUUM ISOLATION AND PRE-PROCESSING ENVIRONMENT
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Pub. No.: WO/2018/204078 International Application No.: PCT/US2018/028258
Publication Date: 08.11.2018 International Filing Date: 19.04.2018
IPC:
H01L 21/67 (2006.01) ,H01L 21/02 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
FRANKLIN, Timothy Joseph; US
Agent:
PATTERSON, B. Todd; US
TABOADA, Keith; US
Priority Data:
62/492,70001.05.2017US
Title (EN) HIGH PRESSURE ANNEAL CHAMBER WITH VACUUM ISOLATION AND PRE-PROCESSING ENVIRONMENT
(FR) CHAMBRE DE RECUIT HAUTE PRESSION AVEC ISOLATION SOUS VIDE ET ENVIRONNEMENT DE PRÉTRAITEMENT
Abstract:
(EN) Embodiments of the disclosure generally relate to a method and apparatus for filling gaps and trenches on a substrate and tools for batch annealing substrates. In one embodiment, a batch processing chamber comprising a lower shell, a substrate transfer port formed through the lower shell, an upper shell disposed on the lower shell, an inner shell disposed within the upper shell, a heater operational to heat the inner shell, a lift plate moveably disposed within the lower shell, a cassette disposed on the lift plate and configured to hold a plurality of substrates within the inner chamber, and an injection port, is disclosed. The inner shell and upper shell bound an outer chamber while the inner shell and the lower shell bound an inner chamber that is partially enveloped by the outer chamber. The injection port is configured to introduce a fluid into the inner chamber.
(FR) Des modes de réalisation de l'invention concernent généralement un procédé et un appareil de remplissage d'espaces et de tranchées sur un substrat et des outils pour des substrats de recuit par lots. Dans un mode de réalisation, une chambre de traitement par lots comprend une coque inférieure, un orifice de transfert de substrat formé à travers la coque inférieure, une coque supérieure disposée sur la coque inférieure, une coque interne disposée à l'intérieur de la coque supérieure, un dispositif de chauffage fonctionnant pour chauffer la coque interne, une plaque de levage disposée de manière mobile à l'intérieur de la coque inférieure, une cassette disposée sur la plaque de levage et conçue pour maintenir une pluralité de substrats à l'intérieur de la chambre interne, et un orifice d'injection. La coque interne et la coque supérieure délimitent une chambre externe tandis que la coque interne et la coque inférieure délimitent une chambre interne qui est partiellement enveloppée par la chambre externe. L'orifice d'injection est conçu pour introduire un fluide dans la chambre interne.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)