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1. (WO2018203526) ALUMINUM VAPOR-DEPOSITED FILM AND PRODUCTION METHOD THEREFOR
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Pub. No.: WO/2018/203526 International Application No.: PCT/JP2018/017193
Publication Date: 08.11.2018 International Filing Date: 27.04.2018
IPC:
B32B 9/00 (2006.01) ,B32B 15/09 (2006.01) ,C23C 14/02 (2006.01) ,C23C 14/08 (2006.01) ,C23C 14/14 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15
Layered products essentially comprising metal
04
comprising metal as the main or only constituent of a layer, next to another layer of a specific substance
08
of synthetic resin
09
comprising polyesters
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
02
Pretreatment of the material to be coated
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
14
Metallic material, boron or silicon
Applicants:
東レフィルム加工株式会社 TORAY ADVANCED FILM CO., LTD. [JP/JP]; 東京都中央区日本橋本石町3丁目3番16号 3-16, Nihonbashi Hongoku-cho 3-chome, Chuo-ku, Tokyo 1030021, JP
Inventors:
石井 聡 ISHII, Satoshi; JP
福田 和生 FUKUDA, Kazuo; JP
室伏 義郎 MUROFUSHI, Yoshiro; JP
坂本 桂太郎 SAKAMOTO, Keitaro; JP
小林 俊樹 KOBAYASHI, Toshiki; JP
東郷 寛 TOUGOU, Hiroshi; JP
鈴木 孝司 SUZUKI, Kouji; JP
Agent:
一條力 ICHIJO, Chikara; JP
Priority Data:
2017-09166002.05.2017JP
2018-02961922.02.2018JP
Title (EN) ALUMINUM VAPOR-DEPOSITED FILM AND PRODUCTION METHOD THEREFOR
(FR) FILM EN ALUMINIUM DÉPOSÉ PAR ÉVAPORATION SOUS VIDE ET SON PROCÉDÉ DE PRODUCTION
(JA) アルミニウム蒸着フィルムおよびその製造方法
Abstract:
(EN) The present invention pertains to an aluminum vapor-deposited film in which a polyethylene terephthalate film, an active treatment layer, and a vapor-deposited layer in which the composition changes continuously from an aluminum oxide vapor-deposited layer to an aluminum vapor-deposited layer are laminated in that order. Provided is an aluminum vapor-deposited film that exhibits superior water-resistant adhesion and thereby achieves excellent adhesion between a vapor-deposited layer and a base film even after being boiled.
(FR) La présente invention concerne un film en aluminium déposé par évaporation sous vide dans lequel un film de polyéthylène téréphtalate, une couche de traitement actif, et une couche déposée par évaporation sous vide, dans laquelle la composition change en continu en passant d'une couche d'oxyde d'aluminium déposée par évaporation sous vide à une couche d'aluminium déposée par évaporation sous vide, sont stratifiés dans cet ordre. La présente invention concerne un film en aluminium déposé par évaporation sous vide qui présente une adhérence résistante à l'eau supérieure et permet ainsi d'obtenir une excellente adhérence entre une couche déposée par évaporation sous vide et un film de base même après avoir été bouilli.
(JA) ポリエチレンテレフタレートフィルム、活性化処理層、酸化アルミニウム蒸着層からアルミニウム蒸着層へ連続的に組成変化する蒸着層がこの順で積層されたアルミニウム蒸着フィルム。 耐水密着性に優れることにより、ボイル後においても、蒸着層と基材フィルムとの密着性に優れたアルミニウム蒸着フィルムを提供する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)