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1. (WO2018203524) SUBSTRATE STORAGE CONTAINER
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Pub. No.: WO/2018/203524 International Application No.: PCT/JP2018/017191
Publication Date: 08.11.2018 International Filing Date: 27.04.2018
IPC:
H01L 21/673 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
673
using specially adapted carriers
Applicants:
ミライアル株式会社 MIRAIAL CO., LTD. [JP/JP]; 東京都豊島区東池袋1丁目24番1号 24-1, Higashi-Ikebukuro 1-chome, Toshima-ku, Tokyo 1700013, JP
Inventors:
松鳥 千明 MATSUTORI Chiaki; JP
Agent:
正林 真之 SHOBAYASHI Masayuki; JP
林 一好 HAYASHI Kazuyoshi; JP
岩池 満 IWAIKE Mitsuru; JP
Priority Data:
PCT/JP2017/01724402.05.2017JP
Title (EN) SUBSTRATE STORAGE CONTAINER
(FR) RÉCIPIENT DE STOCKAGE DE SUBSTRAT
(JA) 基板収納容器
Abstract:
(EN) This substrate storage container is provided with: a container body 2; a lid body which can be attached to and detached from an opening portion of the container body and which can close the opening portion of the container body; a gas flow path 210 which can connect a substrate storage space 27 and a space outside the container body 2; and a gas jetting nozzle part 8 having a plurality of opening portions 802 through which a gas having flowed in the gas flow path 210 is supplied to the substrate storage space 27, wherein a gas-flow-rate uniformizing unit that allows outflow of the gas from the plurality of opening portions 802 at a uniformized flow rate, is included.
(FR) L'invention concerne un récipient de stockage de substrat comprenant : un corps de récipient 2; un corps de couvercle qui peut être fixé à une partie d'ouverture du corps de récipient et détaché de celle-ci et qui peut fermer la partie d'ouverture du corps de récipient; un trajet d'écoulement de gaz 210 qui peut relier un espace de stockage de substrat 27 et un espace à l'extérieur du corps de récipient 2; et une partie de buse d'éjection de gaz 8 ayant une pluralité de parties d'ouverture 802 à travers lesquelles un gaz ayant circulé dans le trajet d'écoulement de gaz 210 est fourni à l'espace de stockage de substrat 27, une unité d'uniformisation de débit de gaz qui permet l'écoulement du gaz à partir de la pluralité de parties d'ouverture 802 à un débit uniformisé est incluse.
(JA) 基板収納容器は、容器本体2と、容器本体開口部に対して着脱可能であり、容器本体開口部を閉塞可能な蓋体と、基板収納空間27と容器本体2の外部の空間とを連通可能な通気路210と、通気路210に流入した気体を基板収納空間27に供給する複数の開口部802を有する気体噴出ノズル部8と、を備え、複数の開口部802から均一化された流量で気体を流出可能とする気体流量均一化部を有する基板収納容器である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)