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1. (WO2018203362) PROCESSING DEVICE AND PROCESSING METHOD

Pub. No.:    WO/2018/203362    International Application No.:    PCT/JP2017/017119
Publication Date: Fri Nov 09 00:59:59 CET 2018 International Filing Date: Tue May 02 01:59:59 CEST 2017
IPC: B23K 26/08
B23K 26/00
B23K 26/066
Applicants: NIKON CORPORATION
株式会社ニコン
Inventors: SHIBAZAKI, Yuichi
柴崎 祐一
Title: PROCESSING DEVICE AND PROCESSING METHOD
Abstract:
A processing device comprising: a first stage system having a table (12) on which a workpiece (W) is mounted, the first stage system moving the workpiece that is held on the table; a beam radiation system (500) including a condensing optical system (530) that emits a beam LB; and a control device for controlling the first stage system and the radiation system. The control device controls the table and the radiation system so as to perform a prescribed process on a target part of the workpiece while the table and the beam from the condensing optical system are moved in relative fashion. The intensity distribution of the beam at a first surface (MP) on the emission-surface side of the condensing optical system, and/or the intensity distribution of the beam at a second surface in which the position of the condensing optical system in the optical axis (AX) direction is different from that of the first surface, can be changed.