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1. (WO2018202656) PROCESS FOR DEPOSITING A LITHIUM COBALT OXIDE-BASED THIN FILM

Pub. No.:    WO/2018/202656    International Application No.:    PCT/EP2018/061100
Publication Date: Fri Nov 09 00:59:59 CET 2018 International Filing Date: Thu May 03 01:59:59 CEST 2018
IPC: H01J 37/34
H01J 37/32
C23C 14/35
C23C 14/34
C23C 14/54
C23C 14/56
C23C 14/08
Applicants: UMICORE
Inventors: LIPPENS, Paul
Title: PROCESS FOR DEPOSITING A LITHIUM COBALT OXIDE-BASED THIN FILM
Abstract:
A process for depositing a lithium cobalt oxide-based thin film on a substrate in which the Li-stoichiometry (LixCoO2) can be tuned within the limits 0.5≤ x≤1.1 using a standard stoichiometric LiCoO2 target material combined with a second target material (Co or CoaOb) resp. Li or Li2O as the case may be either on a dual magnetron or on single magnetrons in adjacent coating chambers. In case of the usage of a dual magnetron, preferentially bipolar pulsed DC with a controlled duty cycle on each of the two cathodes is used in order to tune the stoichiometry of the coating. Alternatively, the LiCoO2 target is powered with unipolar pulsed DC to a power P1 and the Co or CoaOb resp. Li or Li2O target is powered with DC or unipolar pulsed DC to a power P2 in order to tune the stoichiometry. In case of the usage of single magnetrons in adjacent coating chambers, the power loads on the Li or Li2O resp. Co or CoaOb resp. Li or Li2O targets are tuned in order to achieved the required stoichiometry.