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1. (WO2018202572) PROCESS FOR THE GENERATION OF THIN SILICON-CONTAINING FILMS

Pub. No.:    WO/2018/202572    International Application No.:    PCT/EP2018/060845
Publication Date: Fri Nov 09 00:59:59 CET 2018 International Filing Date: Sat Apr 28 01:59:59 CEST 2018
IPC: C07F 7/02
C23C 16/24
Applicants: BASF SE
Inventors: SCHWEINFURTH, David Dominique
MAYR, Lukas
WALDMANN, Daniel
WEIGUNY, Sabine
SCHESCHKEWITZ, David
LESZCZYNSKA, Kinga Izabela
Title: PROCESS FOR THE GENERATION OF THIN SILICON-CONTAINING FILMS
Abstract:
The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular, the present invention relates to a process for producing a silicon-containing film comprising depositing the compound of general formula (I) or (II) onto a solid substrate, wherein R is an alkyl group, an alkenyl group, an aryl group, or a silyl group, X is an olefinic or aromatic group forming a π bond to the silicon atom, Z is a neutral ligand, and n is 1 or 2.