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1. (WO2018200946) QUANTUM DOT-CONTAINING COMPOSITIONS HAVING SUPERIOR RESISTANCE TO DEGRADATION FROM EXPOSURE TO ENVIRONMENTAL CONTAMINANTS WHILE MAINTAINING THEIR LIGHT GENERATING CAPABILITIES
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Pub. No.: WO/2018/200946 International Application No.: PCT/US2018/029783
Publication Date: 01.11.2018 International Filing Date: 27.04.2018
IPC:
C09K 11/02 (2006.01) ,C09K 11/08 (2006.01) ,C09K 11/54 (2006.01) ,C08K 3/01 (2018.01) ,C08K 3/014 (2018.01) ,C08K 3/10 (2018.01) ,C08L 33/08 (2006.01) ,C08L 33/10 (2006.01) ,B82Y 20/00 (2011.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
02
Use of particular materials as binders, particle coatings or suspension media therefor
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
08
containing inorganic luminescent materials
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
08
containing inorganic luminescent materials
54
containing zinc or cadmium
[IPC code unknown for C08K 3/01][IPC code unknown for C08K 3/014]
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3
Use of inorganic ingredients
10
Metal compounds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04
Homopolymers or copolymers of esters
06
of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
08
Homopolymers or copolymers of acrylic acid esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04
Homopolymers or copolymers of esters
06
of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
10
Homopolymers or copolymers of methacrylic acid esters
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
Y
SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES
20
Nano-optics, e.g. quantum optics or photonic crystals
Applicants:
CHAO, Lirong [US/US]; US (US)
HENKEL IP & HOLDING GMBH [DE/DE]; Henkelstrasse 67 40589 Duesseldorf, DE
Inventors:
CHAO, Lirong; US
SUEN, Chyi-Shan; US
Agent:
BAUMAN, Steven C.; US
PIOTROWSKI, James E.; US
COON, Taylor; US
CAMERON, Mary K.; US
LEHMANN, Sun Hee; US
Priority Data:
62/491,28728.04.2017US
Title (EN) QUANTUM DOT-CONTAINING COMPOSITIONS HAVING SUPERIOR RESISTANCE TO DEGRADATION FROM EXPOSURE TO ENVIRONMENTAL CONTAMINANTS WHILE MAINTAINING THEIR LIGHT GENERATING CAPABILITIES
(FR) COMPOSITIONS CONTENANT DES POINTS QUANTIQUES PRÉSENTANT UNE RÉSISTANCE SUPÉRIEURE À LA DÉGRADATION DUE À UNE MISE EN CONTACT AVEC DES CONTAMINANTS ENVIRONNEMENTAUX TOUT EN CONSERVANT LEURS APTITUDES DE GÉNÉRATION DE LUMIÈRE
Abstract:
(EN) Quantum dot-containing composition, films of quantum dot-containing compositions and assemblies fabricated therewith, all of which having superior resistance to degradation from environmental contaminates, such as air and/or moisture, are provided.
(FR) L'invention concerne une composition contenant des points quantiques, des films de compositions contenant des points quantiques et des ensembles fabriqués à l'aide de ceux-ci, présentant tous une résistance supérieure à la dégradation due à des contaminants environnementaux, tels que l'air et/ou l'humidité.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)