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1. (WO2018200536) ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL

Pub. No.:    WO/2018/200536    International Application No.:    PCT/US2018/029160
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Wed Apr 25 01:59:59 CEST 2018
IPC: G03F 7/20
G02B 17/06
G21K 1/06
Applicants: NIKON CORPORATION
SMITH, Daniel, Gene
WILLIAMSON, David, M.
Inventors: SMITH, Daniel, Gene
WILLIAMSON, David, M.
Title: ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL
Abstract:
A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.