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1. (WO2018199950) PATTERN DISCHARGE TO PHOTOCONDUCTOR
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Pub. No.: WO/2018/199950 International Application No.: PCT/US2017/029795
Publication Date: 01.11.2018 International Filing Date: 27.04.2017
IPC:
G03G 15/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G
ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
15
Apparatus for electrographic processes using a charge pattern
Applicants:
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; 11445 Compaq Center Drive West Houston, Texas 77070, US
Inventors:
JERAN, Paul; US
Agent:
HASAN, Nishat; US
Priority Data:
Title (EN) PATTERN DISCHARGE TO PHOTOCONDUCTOR
(FR) DÉCHARGE DE MOTIF SUR UN PHOTOCONDUCTEUR
Abstract:
(EN) Examples disclosed herein relate to an imaging device. The imaging device to include a discharge member to discharge a first pattern on a photoconductor; and a writing engine to control the discharge member to discharge a second pattern to the photoconductor to obscure any latent pattern formed from the first pattern remaining on the photoconductor.
(FR) Selon certains exemples, la présente invention concerne un dispositif d'imagerie. Le dispositif d'imagerie comprend un élément de décharge permettant de décharger un premier motif sur un photoconducteur ; et un moteur d'écriture servant à commander l'élément de décharge pour qu'il décharge un second motif sur le photoconducteur afin d'obscurcir tout motif latent formé à partir du premier motif restant sur le photoconducteur.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)