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1. (WO2018199508) PLASMA TREATMENT DEVICE AND METHOD FOR DEPOSITING CARBON LAYER USING SAME

Pub. No.:    WO/2018/199508    International Application No.:    PCT/KR2018/004149
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Tue Apr 10 01:59:59 CEST 2018
IPC: H01L 21/02
H01L 21/67
H01L 21/324
Applicants: TES CO.,LTD
주식회사 테스
Inventors: YEO, Sang-Hak
여상학
JUNG, Hyo-Jun
정효준
Title: PLASMA TREATMENT DEVICE AND METHOD FOR DEPOSITING CARBON LAYER USING SAME
Abstract:
The present invention relates to a method for depositing a carbon layer, wherein the method for depositing a carbon layer according to the present invention is characterized by including: a step for vaporizing a carbon-based single liquid precursor mixed with nanodiamond powder and supplying the same toward a substrate; and a step for depositing a carbon layer on the substrate.