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1. (WO2018199419) RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE RESIST UNDERLAYER COMPOSITION

Pub. No.:    WO/2018/199419    International Application No.:    PCT/KR2017/013813
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Thu Nov 30 00:59:59 CET 2017
IPC: G03F 7/11
G03F 7/004
G03F 7/00
G03F 7/32
H01L 21/027
H01L 21/324
Applicants: SAMSUNG SDI CO., LTD.
Inventors: CHOI, Yoojeong
BAE, Shinhyo
JOO, Beomjun
KWON, Soonhyung
PARK, Hyeon
BAEK, Jaeyeol
HAN, Kwen-Woo
Title: RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE RESIST UNDERLAYER COMPOSITION
Abstract:
Disclosed are a resist underlayer composition and a method of forming a pattern using the same. The resist underlayer composition includes a polymer having a moiety represented by Chemical Formula 1 and a solvent.