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1. (WO2018199373) HARMFUL GAS PROCESSING FACILITY USING MICROWAVE PLASMA

Pub. No.:    WO/2018/199373    International Application No.:    PCT/KR2017/004869
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Fri May 12 01:59:59 CEST 2017
IPC: H01L 21/3065
H01L 21/67
H01J 37/32
Applicants: CLEAN FACTORS CO., LTD.
주식회사 클린팩터스
Inventors: KANG, Kyoung Doo
강경두
KOO, Min
구민
LEE, Sung Ryong
이성룡
Title: HARMFUL GAS PROCESSING FACILITY USING MICROWAVE PLASMA
Abstract:
The present invention provides a harmful gas processing facility using microwave plasma, comprising: a microwave generation unit; a microwave transmission unit for transmitting and supplying microwaves generated in the microwave generation unit; and a plasma discharge unit which is provided in a pipe through which a harmful gas discharged from a process chamber flows, and which receives the microwaves from the microwave transmission unit so as to generate a plasma discharge therein, thereby decomposing harmful materials within the harmful gas, wherein the plasma discharge unit comprises: a plasma discharge chamber having a cylindrical plasma discharge space through which the harmful gas passes; an antenna unit which is provided in the plasma discharge chamber and arranged to encompass the outside of the plasma discharge space, and which has a plurality of slots for discharging, to the plasma discharge space, a microwave introduced therein; and a shielding member provided in the inner plasma discharge chamber of the antenna unit. Therefore, an antenna unit is formed to encompass a plasma discharge space and microwaves are supplied to the plasma discharge space through a plurality of slots, such that a uniform and efficient plasma discharge is formed inside the plasma discharge space, thereby enabling processing efficiency of harmful gas to be improved and costs to be reduced so as to be economical.