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|1. (WO2018199373) HARMFUL GAS PROCESSING FACILITY USING MICROWAVE PLASMA|
|Applicants:||CLEAN FACTORS CO., LTD.
|Inventors:||KANG, Kyoung Doo
LEE, Sung Ryong
|Title:||HARMFUL GAS PROCESSING FACILITY USING MICROWAVE PLASMA|
The present invention provides a harmful gas processing facility using microwave plasma, comprising: a microwave generation unit; a microwave transmission unit for transmitting and supplying microwaves generated in the microwave generation unit; and a plasma discharge unit which is provided in a pipe through which a harmful gas discharged from a process chamber flows, and which receives the microwaves from the microwave transmission unit so as to generate a plasma discharge therein, thereby decomposing harmful materials within the harmful gas, wherein the plasma discharge unit comprises: a plasma discharge chamber having a cylindrical plasma discharge space through which the harmful gas passes; an antenna unit which is provided in the plasma discharge chamber and arranged to encompass the outside of the plasma discharge space, and which has a plurality of slots for discharging, to the plasma discharge space, a microwave introduced therein; and a shielding member provided in the inner plasma discharge chamber of the antenna unit. Therefore, an antenna unit is formed to encompass a plasma discharge space and microwaves are supplied to the plasma discharge space through a plurality of slots, such that a uniform and efficient plasma discharge is formed inside the plasma discharge space, thereby enabling processing efficiency of harmful gas to be improved and costs to be reduced so as to be economical.