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1. (WO2018198222) EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

Pub. No.:    WO/2018/198222    International Application No.:    PCT/JP2017/016524
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Thu Apr 27 01:59:59 CEST 2017
IPC: H01L 21/027
G03F 7/20
Applicants: NIKON CORPORATION
株式会社ニコン
Inventors: YAMAMOTO, Atsushi
山本 篤史
Title: EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
Abstract:
This exposure apparatus EX is provided with: a beam optical system (12) that is capable of irradiating an object (W) with a charged particle beam (EB (AX)); first magnetic field generating apparatuses (51Z) that generate a magnetic field having a first characteristic in a space (SP) between the beam optical system (12) and the object (W); and second magnetic field generating apparatuses (52X, 52Y) that generate a magnetic field having a second characteristic in the space between the beam optical system (12) and the object (W).