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1. (WO2018197677) LIGHT-CURABLE COMPOSITION
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Pub. No.: WO/2018/197677 International Application No.: PCT/EP2018/060890
Publication Date: 01.11.2018 International Filing Date: 27.04.2018
IPC:
G03F 7/00 (2006.01) ,G03F 7/038 (2006.01) ,G03F 7/032 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
Applicants:
TECHNISCHE UNIVERSITÄT WIEN [AT/AT]; Karlsplatz 13 1040 Wien, AT
Inventors:
STEYRER, Bernhard; AT
LISKA, Robert; AT
STAMPFL, Jürgen; AT
Agent:
ELLMEYER, Wolfgang; AT
Priority Data:
17168663.728.04.2017EP
Title (EN) LIGHT-CURABLE COMPOSITION
(FR) COMPOSITION PHOTODURCISSABLE
(DE) LICHTHÄRTBARE ZUSAMMENSETZUNG
Abstract:
(EN) The invention relates to the use of a light-curable composition as a photopolymerisable material in an additive manufacturing process with heating of the composition, which has a viscosity of at least 20 Pa.s at 20°C and comprises the following components: - a photopolymerisable matrix material, - at least one thermoplastic polymer dissolved therein, and - at least one photoinitiator, characterised in that polycaprolactone or a derivative thereof is used as the dissolved thermoplastic polymer.
(FR) L'invention concerne l'utilisation d'une composition photodurcissable en tant que matériau photopolymérisable lors d'un processus de production génératif en réchauffant la composition qui présente à 20 °C une viscosité d'au moins 20 Pa.s et qui comprend des composants suivants : un matériau de matrice photopolymérisable ; au moins un polymère thermoplastique dissous dans ce dernier ; et au moins un photoinitiateur. La composition est caractérisée en ce que de la polycaprolactone ou un dérivé de cette dernière est employé(e) en tant que polymère thermoplastique dissous.
(DE) Die Erfindung betrifft die Verwendung einer lichthärtbaren Zusammensetzung als photopolymerisierbares Materialin einem generativen Fertigungsprozess unter Erwärmung der Zusammensetzung, die bei 20 °C eine Viskosität von zumindest 20 Pa.s aufweist und folgende Komponenten umfasst: -ein photopolymerisierbares Matrixmaterial, -zumindest ein darin gelöstes thermoplastisches Polymer und -zumindest einen Photoinitiator; mit dem Kennzeichen, dassals gelöstes thermoplastisches Polymer Polycaprolacton oder ein Derivat davon eingesetzt wird.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)