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1. (WO2018197535) POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME

Pub. No.:    WO/2018/197535    International Application No.:    PCT/EP2018/060540
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Thu Apr 26 01:59:59 CEST 2018
IPC: G03F 7/022
G03F 7/023
G03F 7/031
G03F 7/075
Applicants: MERCK PATENT GMBH
Inventors: YOSHIDA, Naofumi
TAKAHASHI, Megumi
TANIGUCHI, Katsuto
Title: POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME
Abstract:
[Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides apositive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a quaternaryammonium structureandthecapability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.