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1. (WO2018197305) SOFT MAGNETIC MULTILAYER DEPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER
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Pub. No.: WO/2018/197305 International Application No.: PCT/EP2018/059943
Publication Date: 01.11.2018 International Filing Date: 18.04.2018
IPC:
H01F 41/18 (2006.01) ,C23C 14/35 (2006.01) ,C23C 14/50 (2006.01) ,H01F 17/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41
Apparatus or processes specially adapted for manufacturing or assembling the devices covered by this subclass
14
for applying magnetic films to substrates
18
by cathode sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
35
by application of a magnetic field, e.g. magnetron sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
50
Substrate holders
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
17
Fixed inductances of the signal type
Applicants:
EVATEC AG [CH/CH]; Hauptstrasse 1a 9477 Trübbach, CH
Inventors:
BLESS, Martin; CH
FALUB, Claudiu Valentin; CH
Agent:
TROESCH SCHEIDEGGER WERNER AG; Schwäntenmos 14 8126 Zumikon, CH
Priority Data:
00562/1727.04.2017CH
Title (EN) SOFT MAGNETIC MULTILAYER DEPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER
(FR) APPAREIL DE DÉPÔT MULTICOUCHE À AIMANTATION TEMPORAIRE, PROCÉDÉS DE FABRICATION ET MULTICOUCHE MAGNÉTIQUE
Abstract:
(EN) The soft magnetic material multilayer deposition apparatus comprises a circular arrangement of a multitude of substrate carriers (11) in a circular inner space of a vacuum transport chamber (3). In operation the substrate carriers (11) pass treatment stations (17A, 17B). One of the treatment stations (17A) has a sputtering target (TA) consisting of a first soft magnetic material. A second treatment station (17B) comprises a target (TA) consisting of a second soft magnetic material which is different from the first soft magnetic material of the first addressed target (TA). A control unit (23) controlling relative movement of the substrate carriers (11) with respect to the treatment stations (17A, 17B) provides for more than one 360° revolution of the multitude of substrate carriers (11) around the axis AX of the circular inner space of the vacuum transport chamber (3), while the first and second treatment stations (17A, 17B) are continuously operative.
(FR) L'invention concerne un appareil de dépôt multicouche de matériau à aimantation temporaire comprenant un agencement circulaire d'une multitude de supports de substrat (11) dans un espace interne circulaire d'une chambre de transport sous vide (3). Pendant le fonctionnement, les supports de substrat (11) passent par des postes de traitement (17A, 17B). L'un des postes de traitement (17A) comporte une cible de pulvérisation (TA) constituée d'un premier matériau à aimantation temporaire. Un second poste de traitement (17B) comprend une cible (TA) constituée d'un second matériau à aimantation temporaire qui est différent du premier matériau à aimantation temporaire de la première cible adressée (TA). Une unité de commande (23) commandant un déplacement relatif des supports de substrat (11) par rapport aux postes de traitement (17A, 17B) fait subir plus d'une révolution à 360° à la multitude de supports de substrat (11) autour de l'axe AX de l'espace interne circulaire de la chambre de transport sous vide (3), tandis que les premier et second postes de traitement (17A, 17B) sont opérationnels en continu.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)