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1. (WO2018196319) CARBON NANO-DOT PHOTORESIST WITH FLUORESCENT EFFECT, AND IMAGING METHOD THEREOF

Pub. No.:    WO/2018/196319    International Application No.:    PCT/CN2017/109454
Publication Date: Fri Nov 02 00:59:59 CET 2018 International Filing Date: Tue Nov 07 00:59:59 CET 2017
IPC: G03F 7/038
G03F 7/42
C09K 11/65
Applicants: SOOCHOW UNIVERSITY
苏州大学
Inventors: CHEN, Gaojian
陈高健
WENG, Yuyan
翁雨燕
LI, Zhiyun
李志运
Title: CARBON NANO-DOT PHOTORESIST WITH FLUORESCENT EFFECT, AND IMAGING METHOD THEREOF
Abstract:
A carbon nano-dot photoresist with a fluorescent effect, and an imaging method thereof, the photosensitive resin being a sugar-containing polymer, the controllable carbonisation and self-crosslinking effect of same in a certain electron beam exposure dose range being used to prepare carbon nano-dots having nano-scale precision positioning, and the fluorescent properties of same under illumination of specific wavelengths being used to implement fluorescence development and other applications. Water is the only solvent used, having the characteristic of being environmentally friendly, and fluorescent carbon nano-dots with any nano pattern can be formed at any specified position, resolving the two problems of fluorescent particle preparation and nano-scale precision positioning, and having wide scope for application in semiconductor manufacturing and the biological field.